Method to determine a detection capability of the die-to-database mask inspection system in regard to pinhole and pindot defects

被引:1
|
作者
Avakaw, SM [1 ]
机构
[1] Opto Mech Equipment, Design Off Precis Elect Tools Bldg, Minsk, BELARUS
来源
19TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS | 2003年 / 5148卷
关键词
inspection; reticles; detection probability;
D O I
10.1117/12.515104
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The paper presents a description and results of the use of a new method to determine a capability to detect defects such as pinholes and pindots in order to test reticle and photomask inspection systems EM-6029B and EM-6329 using a die-to-database comparison method. In the introductory part given are the reasons for the necessity to determine a probability to detect defects with sizes smaller than the tool detection threshold, as well as given are the grounds for the necessity to precisely determine a scope of tests required to determine this probability. In the main part presented is a method of testing the equipment with the purpose to determine a probability to detect defects such as a pindot and a pinhole, including a procedure to estimate a required number of experiments to verify the probability to detect features of different sizes with a given confidence coefficient.
引用
收藏
页码:119 / 127
页数:9
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