Results from prototype die-to-database reticle inspection system

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作者：
KLA-Tencor Corp., 160 Rio Robles, San Jose, CA 95134, United States [1 ]
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来源：
Proc SPIE Int Soc Opt Eng |
关键词：
193nm - 32nm - 3XHP - 4X HP - Reticle - Sensitivity - SRAF;
D O I：
72723O
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