Nanoscale details of liquid drops on 10 patterned surfaces revealed by etching

被引:1
|
作者
Wang, Xuemei
Faria-Briceno, Juan J.
Busani, Tito
Brueck, S. R. J. [1 ]
机构
[1] Univ New Mexico, Ctr High Technol Mat, Albuquerque, NM 87106 USA
来源
基金
美国国家科学基金会;
关键词
WETTING PROPERTIES; CASSIE STATE; CONTACT LINE; ENERGY; LITHOGRAPHY; DISSOLUTION; BEHAVIOR;
D O I
10.1116/1.5116703
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reports the wetting properties and spatially dependent etch rate variation on the interaction of a dilute potassium hydroxide (KOH):water droplet with a nanopatterned one-dimensional, 500-nm period, grooved photoresist surface. The KOH liquid drop showed a hydrophilic contact angle both along and perpendicular to the grooves and a more significant elongation distortion as compared to a deionized water drop. From the etching of the photoresist lines by the KOH solution, monitored by SEM after the drop was removed, the droplet was in a Cassie-Baxter state with the liquid excluded from the grooves and was pinned at the edge of the grating lines. The etch rate varied with the evaporation rate of the droplet and showed a dependence on the local contact angle with faster etching for smaller contact angles. (C) 2019 Author(s).
引用
收藏
页数:7
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