Variation of Optical Quenching of Photoconductivity with Resistivity in Unintentional Doped GaN

被引:4
|
作者
Hou Qi-Feng [1 ]
Wang Xiao-Liang [1 ,2 ]
Xiao Hong-Ling [1 ,2 ]
Wang Cui-Mei [1 ,2 ]
Yang Cui-Bai [1 ,2 ]
Li Jin-Min [1 ]
机构
[1] Chinese Acad Sci, Inst Semicond, Ctr Mat Sci, Beijing 100083, Peoples R China
[2] Chinese Acad Sci, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
关键词
N-TYPE GAN; DEEP LEVELS; DEFECTS;
D O I
10.1088/0256-307X/27/5/057104
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The optical quenching of photoconductivity under dual illumination in GaN samples with different resistivity is investigated to reveal the variation of deep levels. The samples are grown by metal organic chemical vapour deposition without intentional doping. Quenching bands centered at 1.35 eV, 1.55 eV, 1.98 eV, and 2.60 eV are observed. It is found that the 1.98 eV quenching band is dominated in all the samples and the 2.60 eV band is observed only in the high-resistivity samples. The possible defect levels responsible for the quenching bands and the origin of different quenching behaviour at 2.60 eV are discussed. It is suggested that the defect level responsible for quenching at 2.60 eV plays an important role for the enhancement of resistivity.
引用
收藏
页数:4
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