Ion beam reactive sputter-deposition of silicon and zirconium oxides

被引：0
|
作者：
Pringle, SD [1 ]
Valizadeh, R [1 ]
Colligon, JS [1 ]
Faunce, CA [1 ]
Kheyrandish, H [1 ]
机构：
[1] UNIV SALFORD,DMM,SALFORD M5 4WT,LANCS,ENGLAND
来源：
ION-SOLID INTERACTIONS FOR MATERIALS MODIFICATION AND PROCESSING | 1996年 / 396卷
关键词：
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：563 / 568
页数：6
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