共 50 条
- [41] Sub-100 nm soft lithography for optoelectronics applications [J]. 2007 IEEE LEOS ANNUAL MEETING CONFERENCE PROCEEDINGS, VOLS 1 AND 2, 2007, : 331 - 332
- [42] Polarized Upconversion of sub-100 nm Single Nanoparticles [J]. NANO LETTERS, 2024, 24 (35) : 10915 - 10920
- [43] Analysis and optimization of sub-100 nm NMOS with halo [J]. Guti Dianzixue Yanjiu Yu Jinzhan, 2006, 4 (445-449):
- [44] Sub-100 nm structures by neutral atom lithography [J]. MICROELECTRONIC ENGINEERING, 1999, 46 (1-4) : 105 - 108
- [45] Templated fabrication of sub-100 nm periodic nanostructures [J]. CHEMICAL COMMUNICATIONS, 2008, (27) : 3163 - 3165
- [46] Sub-100 nm patterning with an amorphous fluoropolymer mold [J]. LANGMUIR, 2004, 20 (06) : 2445 - 2448
- [47] Sub-100 Microsecond Time Resolved SAXS at BioCAT [J]. ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES, 2022, 78 : A146 - A146
- [48] Ultra-high density board technology for sub-100μm pitch nano-wafer level packaging [J]. PROCEEDINGS OF 5TH ELECTRONICS PACKAGING TECHNOLOGY CONFERENCE, 2003, : 125 - 129
- [50] Sub-100 nm IR spectromicroscopy of living cells [J]. OPTICS LETTERS, 2008, 33 (14) : 1611 - 1613