Pattern recognition in self-assembly

被引：38
|
作者：
Muthukumar, M [1 ]
机构：
[1] Univ Massachusetts, Dept Polymer Sci & Engn, Amherst, MA 01003 USA
来源：
CURRENT OPINION IN COLLOID & INTERFACE SCIENCE | 1998年 / 3卷 / 01期
关键词：
D O I：
10.1016/S1359-0294(98)80041-1
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
A common conceptual premise is shared by recognition of chemically patterned surface patches by isolated macromolecules and the self-assembly of diblock copolymer melts and polymer alloys at patterned interfaces. The past year has seen both conceptual and experimental advances in fabricating self-assemblies in a controlled way. These two processes are essential for successful fabrication of materials of order over many length scales.
引用
收藏
页码：48 / 54
页数：7
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