Properties of doped ZnO thin films grown by simultaneous dc and RF magnetron sputtering

被引：16
|
作者：
Sahu, D. R. [1 ,2 ]
机构：
[1] Univ Witwatersrand, Sch Phys, ZA-2050 Johannesburg, South Africa
[2] Univ Witwatersrand, DST NRF Ctr Excellence Strong Mat, ZA-2050 Johannesburg, South Africa
来源：
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS | 2010年 / 171卷 / 1-3期
关键词：
ZnO; Sputtering; Coatings; Electrical and optical properties; PULSED-LASER DEPOSITION; ZINC-OXIDE FILMS; OPTICAL-PROPERTIES; AG; CU; AL; TEMPERATURE; THICKNESS; SPRAY;
D O I：
10.1016/j.mseb.2010.03.080
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Doped ZnO films such as Cu- and Ag-doped with different at.% have been grown using simultaneous RE magnetron sputtering of ZnO and dc sputtering of Cu and Ag. The structural, electrical and optical properties of the films are investigated using different characterization tools. It is observed that both films show different surface morphologies with preferential crystalline growth orientation along (0 0 2). More significantly Ag-doped ZnO film show low resistance and high transmittance than that of Cu-doped film of same thickness and doped content. ZnO film doped with 2 at.% Cu shows high resistivity of the order 10(8) Omega cm. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码：99 / 103
页数：5
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