In focus: Recognition mediated self-assembly

被引：0
|
作者：
Rotello, Vincent [1 ]
Thayumanavan, S. 'Thai' [1 ]
机构：
[1] Univ Massachusetts, Dept Chem, Amherst, MA 01003 USA
来源：
POLYMER INTERNATIONAL | 2007年 / 56卷 / 04期
关键词：
D O I：
10.1002/pi.2288
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
引用
收藏
页码：435 / 435
页数：1
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