In focus: Recognition mediated self-assembly

被引：0

作者：

Rotello, Vincent ^{[1
]}

Thayumanavan, S. 'Thai' ^{[1
]}

机构：

[1] Univ Massachusetts, Dept Chem, Amherst, MA 01003 USA

来源：

POLYMER INTERNATIONAL | 2007年 / 56卷 / 04期

关键词：

D O I：

10.1002/pi.2288

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：435 / 435

页数：1

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