New design strategy for broadband perfect absorber by coupling effects between metamaterial and epsilon-near-zero mode

被引:15
|
作者
Meng, Zhenya [1 ,3 ]
Cao, Hailin [1 ,2 ]
Wu, Xiaodong [1 ]
机构
[1] Chongqing Univ, Sch Microelect & Commun Engn, Chongqing 400044, Peoples R China
[2] Chongqing Univ, State Key Lab Power Transmiss Equipment & Syst Se, Chongqing 400044, Peoples R China
[3] Guizhou Prov Key Lab Radio Astron & Data Proc, Guiyang 550025, Guizhou, Peoples R China
基金
中国国家自然科学基金;
关键词
Enhancing light absorption; Broadband perfect absorbers; Epsilon-near-zero mode; Gap plasmon resonance; Metamaterials; INDIUM TIN OXIDE; LIGHT-ABSORPTION; GRAPHENE;
D O I
10.1016/j.optmat.2019.109347
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We propose a novel and simple method to achieve perfect light absorption over a broadband by coupling a gap plasmon mode to an epsilon-near-zero (ENZ) mode, which is a new path for tailoring light-matter interactions. Near-perfect light absorption (over 99%) in the wavelength range of 1400 nm-1655 nm can be achieved utilizing a gold-disk periodically patterned metal-dielectric-metal (MDM) device by integrating an ultrathin ITO (indium tin oxide) film. The ENZ mode can be excited effectively by coupling the gap plasmon resonance to conducting ITO (indium tin oxide) nanolayer (ENZ wavelength of the ITO nanofilm close to 1403 nm) under normal incidence. Compared with the device without ITO nanolayer, the device integrating ITO ultrathin film shows wideband perfect light absorption. Besides, the thickness of SiO2 spacer layer is critical for the coupling strength of metamaterial resonator and ENZ mode. To achieve broadband absorption, the coupling strength of the ENZ mode and gap plasmon mode should be between the strong coupling and weak coupling regimes. The method is also effective for the design of multiband optoelectronic devices with simple structure and low cost.
引用
收藏
页数:7
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