Electron irradiation effects on DC electrical performances of SiGe HBT in a comparison with SiBJT

被引:0
|
作者
Meng, XT [1 ]
Zhang, XM
Wang, JL
Huang, WT
Chen, PY
Jia, HY
Tsien, PS
机构
[1] Tsinghua Univ, Inst Nucl & New Energy Technol, Beijing 100084, Peoples R China
[2] Tsinghua Univ, Inst Microelect, Beijing 100084, Peoples R China
关键词
semiconductor technology; SiGeHBT; electron irradiation; SiBJT; DC electrical performance;
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The DC characteristics of SiGe HBT irradiated at different electron dose have been studied in a comparison with those of Si BJT. Generally, I(b) and I(b)-I(b0) increase, I(c), I(c)-I(c0) and its +/- transition V(be) as well as DC current gain beta decreases with increasing dose; increase of I(b)-I(b0) with increasing dose for Si BJT is much larger than that for SiGe HBT; beta increases with V(be) or I(b), but decreases at I(b) < 0.25 mA with I(b), and congregates at higher dose; and a damage factor d(beta) is much less at the same dose for SiGe HBT than for Si BJT. SiGe HBT has much better and-radiation performance than Si BJT. Some anomalous phenomena for increase of I(c), I(c)-I(c0), I(b)-I(b0) and beta at low dose have been found. Some electron traps have been measured. The mechanism of changes of characteristics is discussed.
引用
收藏
页码:330 / 339
页数:10
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