Experimental investigation of a pulsed Rb-Ar excimer-pumped alkali laser

被引：4

作者：

Cheng, Hongling ^{[1
,2
]}

Wang, Zhimin ^{[2
]}

Zhang, Fengfeng ^{[2
]}

Wang, Mingqiang ^{[2
]}

Tian, Zhaoshuo ^{[1
]}

Peng, Qinjun ^{[2
]}

Cui, Dafu ^{[2
]}

Xu, Zuyan ^{[2
]}

机构：

[1] Harbin Inst Technol Weihai, Informat Optoelect Res Inst, Weihai 264209, Shandong, Peoples R China

[2] Chinese Acad Sci, Tech Inst Phys & Chem, Key Lab Funct Crystal & Laser Technol, Res Ctr Laser Phys & Technol, Beijing 100190, Peoples R China

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2017年 / 56卷 / 03期

关键词：

795-NM RUBIDIUM LASER; VAPOR LASER; MODEL; CS;

D O I：

10.7567/JJAP.56.032701

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We present experimental results of an exciplex-pumped alkali laser (XPAL) at 780nm based on the 5(2)P(3/2) -> 5(2)S(1/2) transition of the Rb atom in mixtures of Rb vapor and Ar. A laboratory-built Ti: sapphire laser with a pulse repetition rate of 3 kHz and a pulse width of 100 ns is used as the pump source. The maximum laser pulse energy of 0.26 mu J at 780nm is obtained under an absorbed pump pulse energy of 42 mu J at 755nm in mixtures of Rb vapor and Ar at a temperature of 423 K, corresponding to an optical conversion efficiency of 0.62%. Further experiments show that the output laser at 780nm can always be detected for pump wavelengths ranging from 754 to 759 nm, indicating that Rb-Ar mixtures can be effectively pumped by commercial laser diodes ( LDs) with a bandwidth of 5 nm. (C) 2017 The Japan Society of Applied Physics

引用

页码：1 / +

页数：4

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