Magnetotransport properties of γ-FeMn thin films grown by high-temperature sputtering

被引:7
|
作者
Shiomi, Yuki [1 ,2 ,3 ]
机构
[1] Univ Tokyo, Dept Appl Phys, Tokyo 1138656, Japan
[2] Univ Tokyo, QPEC, Tokyo 1138656, Japan
[3] RIKEN, CEMS, Wako, Saitama 3510198, Japan
来源
AIP ADVANCES | 2018年 / 8卷 / 08期
关键词
ROOM-TEMPERATURE; ANTIFERROMAGNET; ORDER; ANOMALIES; ALLOYS; MEMORY;
D O I
10.1063/1.5044594
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
gamma-FeMn is a topological antiferromagnet which hosts a noncoplanar spin structure at room temperature, promising for application to antiferromagnetic spintronics. In this work, we have investigated magnetotransport properties of FeMn thin films grown by dc magnetron sputtering on Al2O3 (0001) substrates. gamma-phase (fcc) FeMn thin films are successfully obtained with use of a Cu seed layer covering with the Al2O3 surface, while nonmagnetic alpha-phase (bcc) FeMn thin films are formed without a Cu seed layer. When the sputtering temperature is set at 500 degrees C, gamma-FeMn films grown on Cu/Al2O3 are highly oriented along the (111) plane, but minor alpha-Fe phases are included owing to alloying with the Cu layer. Ferromagnetic transports of alpha-Fe phases are observed in Hall and Nernst effects at lowmagnetic fields. By contrast, the slope of Hall conductivity at high magnetic fields is found to be several times larger for the gamma-FeMn phase than for the alpha-FeMn phase, which suggests that the antiferromagnetic spin structure of gamma-FeMn contributes to the Hall effect. (C) 2018 Author(s).
引用
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页数:7
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