InGaAsN/GaAs QD and QW structures grown by MOVPE

被引:5
|
作者
Daniltsev, VM [1 ]
Drozdov, MN [1 ]
Drozdov, YN [1 ]
Gaponova, DM [1 ]
Khrykin, OI [1 ]
Murel, AV [1 ]
Shashkin, VI [1 ]
Vostokov, NV [1 ]
机构
[1] Russian Acad Sci, Heterostruct Technol Dept, Inst Phys Microstruct, Nizhnii Novgorod 603950, Russia
关键词
nitrogen incorporation; photoluminescence; metalorganic vapor phase epitaxy; quantum dots; quantum wells; GaInAsN;
D O I
10.1016/S0022-0248(02)01923-1
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
InGaAsN/GaAs heterostructures were grown by low pressure MOVPE. Their structural and optical properties were investigated. Pseudomorphic InGaAsN/GaAs layers with a band gap as low as 0.9 eV as well as ternary InAsN quantum dot and well structures were fabricated. It was shown that the addition of a few percent of nitrogen during the formation of the InAs quantum dots led to a decrease in their dimensions and density which was also accompanied by a sharpening of their uniformity distribution. An increase of the nitrogen content reduced the lattice mismatch between InAsN and GaAs. This also gave rise to a layer-by-layer growth mode and smooth heterointerfaces. The InAsN/GaAs multiple quantum well heterostructures so fabricated had improved structural quality and demonstrated intense photoluminescence at room temperature. (C) 2002 Published by Elsevier Science B.V.
引用
收藏
页码:343 / 347
页数:5
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