Growth of quantum-confined indium phosphide inside MCM-41

被引:154
|
作者
Agger, JR
Anderson, MW
Pemble, ME
Terasaki, O
Nozue, Y
机构
[1] Univ Manchester, Inst Sci & Technol, Dept Chem, Manchester M60 1QD, Lancs, England
[2] Tohoku Univ, Dept Phys, Sendai, Miyagi 980, Japan
来源
JOURNAL OF PHYSICAL CHEMISTRY B | 1998年 / 102卷 / 18期
关键词
D O I
10.1021/jp972994u
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
An array of analytical techniques comprising powder X-ray diffraction, solid-state NMR spectroscopy, high-resolution transmission electron microscopy, nitrogen adsorption, and UV/vis diffuse reflectance spectroscopy has been applied to study the incorporation of indium phosphide semiconductor inside MCM-41 materials by metal organic chemical vapor deposition. Line broadening in the X-ray diffraction patterns suggests the existence of both large surface deposited indium phosphide particles and nanosized indium phosphide particles deposited within the pores. High-resolution transmission electron microscopy corroborates this result: surface deposits have been imaged, and analysis of electron diffraction patterns provides-evidence of the existence of nanoparticles. Nitrogen adsorption provides information on pore filling. Quantum-confinement effects,, brought about by the nanoparticle size regime, are evidenced by upfield shifting of the indium phosphide resonance in the P-31 magic-angle-spinning NMR spectra and by blue shifting of the band gap dependent transition in the UV/vis absorption spectra.
引用
收藏
页码:3345 / 3353
页数:9
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