Quantitative detection of small amount of nitrogen in Czochralski-grown silicon crystals

被引:19
|
作者
Ono, H
Horikawa, M
机构
[1] NEC Corp Ltd, Silicon Syst Res Labs, Kanagawa 2291198, Japan
[2] Elpida Memory Inc, Kanagawa 2291198, Japan
来源
关键词
nitrogen; Czochralski-grown; silicon; infrared absorption; electronic transition; concentration;
D O I
10.1143/JJAP.42.L261
中图分类号
O59 [应用物理学];
学科分类号
摘要
We successfully detected small amounts of nitrogen with a concentration of 3 x 10(13) cm(-3) in a nitrogen-doped Czochralski-grown Si crystal. O-N-O complexes (or shallow thermal donors) were observed through infrared spectroscopy of electronic transition between hydrogen-like levels of the complexes. This method is very sensitive and shows promise as a means of quantitatively detecting nitrogen in Si wafers of 10(12)-10(14) cm(-3). We found that almost all the N was in the form of O-N-O complexes when the N concentration is less than 1 x 10(14) cm(-3). Therefore, conventional methods that measure localized vibrational modes due to N-N and N-N-O complexes cannot detect nitrogen of less than 1 x 10(14) cm(-3), not only because of the detection limit but also the lack of such vibrational centers.
引用
收藏
页码:L261 / L263
页数:3
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