Optical properties of nanocrystalline GaN films prepared by DC magnetron sputtering

被引:0
|
作者
Zhang, Z. X. [1 ]
Pan, X. J. [1 ]
Jia, L. [1 ]
Xie, E. Q. [1 ]
机构
[1] Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China
来源
关键词
gallium nitride; semiconductors; thin films; sputtering; Raman; luminescence;
D O I
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中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Nanocrystalline GaN films with different crystallite size were prepared by direct current (DC) magnetron sputtering technique under different substrate temperature. The sizes of nanocrystals derived from grazing-incidence X-ray diffraction (GIXRD) peaks were 4 nm and 7 nm for films grown at 770 K and 870 K, respectively. The Raman peak centered at 657 cm(-1) might be primarily attributed to a V-N-related band in the nanocrystalline GaN. The similar broad near-band-edge emission peak about 356 nm characterized by photoluminescence (PL) was observed and no yellow luminescence can be found.
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页码:2509 / 2511
页数:3
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