Multilayers of amorphous carbon prepared by cathodic arc deposition

被引:63
|
作者
Anders, S
Callahan, DL
Pharr, GM
Tsui, TY
Bhatia, CS
机构
[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
[2] Rice Univ, Dept Mat Sci, Houston, TX 77005 USA
[3] Adv Micro Devices Inc, Sunnyvale, CA 94088 USA
[4] IBM Corp, SSD, San Jose, CA 95193 USA
来源
SURFACE & COATINGS TECHNOLOGY | 1997年 / 94-5卷 / 1-3期
关键词
amorphous carbon film; cathodic arc deposition; Monte Carlo simulation;
D O I
10.1016/S0257-8972(97)00346-0
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Filtered cathodic are deposition is an effective technique for preparing amorphous hard carbon films of high quality. Pulsed biasing of the substrate leads to a variation of the ion energy. Therefore the film properties, which are influenced by the ion energy, can be changed over a wide range. Using an alternating high- and low-bias voltage, we have formed multilayers of hard and soft amorphous carbon films. The structure and mechanical properties of the multilayers were investigated by transmission electron microscopy and nanoindentation. They are discussed in relation to Monte Carlo computer simulations of the deposition process. It was found that the multilayer structure formation can be well predicted by the Monte Carlo computer code. (C) 1997 Elsevier Science S.A.
引用
收藏
页码:189 / 194
页数:6
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