hexagonal boron nitride;
van der Waals heterostructure;
memristor;
BREAKDOWN;
GRAPHENE;
D O I:
10.1088/1674-4926/43/5/052003
中图分类号:
O469 [凝聚态物理学];
学科分类号:
070205 ;
摘要:
With the atomically sharp interface and stable switching channel, van der Waals (vdW) heterostructure memristors have attracted extensive interests for the application of high-density memory and neuromorphic computing. Here, we demonstrate a new type of vdW heterostructure memristor device by sandwiching a single-crystalline h-BN layer between two thin graphites. In such a device, a stable bipolar resistive switching (RS) behavior has been observed for the first time. We also characterize their switching performance, and observe an on/off ratio of >10 (3) and a minimum RESET voltage variation coefficient of 3.81%. Our work underscores the potential of 2D materials and vdW heterostructures for emerging memory and neuromorphic applications.
机构:
Harbin Inst Technol Weihai, Sch Mat Sci & Engn, Weihai 264209, Peoples R ChinaHarbin Inst Technol Weihai, Sch Mat Sci & Engn, Weihai 264209, Peoples R China
Zhong, Bo
Liu, Wei
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Harbin Inst Technol Weihai, Sch Mat Sci & Engn, Weihai 264209, Peoples R ChinaHarbin Inst Technol Weihai, Sch Mat Sci & Engn, Weihai 264209, Peoples R China
Liu, Wei
Yu, Yuanlie
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机构:
King Abdullah Univ Sci & Technol, Adv Membrane & Porous Mat Ctr, Thuwal 239556900, Saudi ArabiaHarbin Inst Technol Weihai, Sch Mat Sci & Engn, Weihai 264209, Peoples R China
Yu, Yuanlie
Xia, Long
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Harbin Inst Technol Weihai, Sch Mat Sci & Engn, Weihai 264209, Peoples R ChinaHarbin Inst Technol Weihai, Sch Mat Sci & Engn, Weihai 264209, Peoples R China
Xia, Long
Zhang, Jiulin
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Harbin Inst Technol Weihai, Sch Mat Sci & Engn, Weihai 264209, Peoples R ChinaHarbin Inst Technol Weihai, Sch Mat Sci & Engn, Weihai 264209, Peoples R China
Zhang, Jiulin
Chai, Zhenfei
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Harbin Inst Technol Weihai, Sch Mat Sci & Engn, Weihai 264209, Peoples R ChinaHarbin Inst Technol Weihai, Sch Mat Sci & Engn, Weihai 264209, Peoples R China
Chai, Zhenfei
Wen, Guangwu
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机构:
Shandong Univ Technol, Sch Mat Sci & Engn, Zibo 255000, Peoples R ChinaHarbin Inst Technol Weihai, Sch Mat Sci & Engn, Weihai 264209, Peoples R China
机构:
Department of Applied Physics, Waseda Univ., 4-3-1 Okubo, S., Tokyo, JapanDepartment of Applied Physics, Waseda Univ., 4-3-1 Okubo, S., Tokyo, Japan
Rokuta, E.
Hasegawa, Y.
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Department of Applied Physics, Waseda Univ., 4-3-1 Okubo, S., Tokyo, JapanDepartment of Applied Physics, Waseda Univ., 4-3-1 Okubo, S., Tokyo, Japan
Hasegawa, Y.
Itoh, A.
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Department of Applied Physics, Waseda Univ., 4-3-1 Okubo, S., Tokyo, JapanDepartment of Applied Physics, Waseda Univ., 4-3-1 Okubo, S., Tokyo, Japan
Itoh, A.
Yamashita, K.
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机构:
Department of Applied Physics, Waseda Univ., 4-3-1 Okubo, S., Tokyo, JapanDepartment of Applied Physics, Waseda Univ., 4-3-1 Okubo, S., Tokyo, Japan
Yamashita, K.
Tanaka, T.
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Department of Applied Physics, Waseda Univ., 4-3-1 Okubo, S., Tokyo, JapanDepartment of Applied Physics, Waseda Univ., 4-3-1 Okubo, S., Tokyo, Japan
Tanaka, T.
Otani, S.
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机构:
Natl. Inst. for Res. in Inorg. Mat., Namiki 1-1, Tsukuba, 305, Ibaraki, JapanDepartment of Applied Physics, Waseda Univ., 4-3-1 Okubo, S., Tokyo, Japan
Otani, S.
Oshima, C.
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机构:
Department of Applied Physics, Waseda Univ., 4-3-1 Okubo, S., Tokyo, JapanDepartment of Applied Physics, Waseda Univ., 4-3-1 Okubo, S., Tokyo, Japan