Relationship between capacitance and conductance in MOS capacitors

被引:0
|
作者
Caruso, E. [1 ]
Lin, J. [1 ]
Monaghan, S. [1 ]
Cherkaoui, K. [1 ]
Floyd, L. [1 ]
Gity, F. [1 ]
Palestri, P. [2 ]
Esseni, D. [2 ]
Selmi, L. [3 ]
Hurley, P. K. [1 ]
机构
[1] Univ Coll Cork, Tyndall Natl Inst, Cork, Ireland
[2] Univ Udine, DPIA, Via Sci 206, I-33100 Udine, Italy
[3] Univ Modena & Reggio Emilia, DIEF, Via P Vivarelli 10-1, I-41125 Modena, Italy
基金
爱尔兰科学基金会; 欧盟地平线“2020”;
关键词
Characterization; extraction technique; MOS; multi-frequency; C-V; G-V; minority carrier lifetime; oxide capacitance; doping;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, we describe how the frequency dependence of conductance (G) and capacitance (C) of a generic MOS capacitor results in peaks of the functions G/omega and - omega dC/d omega. By means of TCAD simulations, we show that G/omega and -omega dC/d omega peak at the same value and at the same frequency for every bias point from accumulation to inversion. We illustrate how the properties of the peaks change with the semiconductor doping (N-D), oxide capacitance (C-OX), minority carrier lifetime (tau(g)), interface defect parameters (N-IT, sigma) and majority carrier dielectric relaxation time (tau(r)). Finally, we demonstrate how these insights on G/omega and -omega dC/d omega can be used to extract C-OX, N-D and tau(g) from InGaAs MOSCAP measurements
引用
收藏
页码:315 / 318
页数:4
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