Temperature dependence of the phase manipulation feasibility between c(4 x 2) and p(2 x 2) on the Si(100) surface

被引:11
|
作者
Sagisaka, K [1 ]
Fujita, D [1 ]
Kido, G [1 ]
Koguchi, N [1 ]
机构
[1] Natl Inst Mat Sci, Nanomat Lab, Tsukuba, Ibaraki 3050047, Japan
关键词
scanning tunneling microscopy; surface relaxation and reconstruction; surface structure; morphology; roughness and topography; silicon;
D O I
10.1016/j.susc.2004.06.062
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Previously, we have reported that it is possible to manipulate the Si(100) surface phases between c(4 x 2) and p(2 x 2) by precise sample bias control in scanning tunneling microscopy (STM). Electron injection into the surface from the STM tip is responsible for the phase manipulation. In the present study, the phase manipulation by STM is thoroughly studied in a wide range of temperature from 4.2 to 100 K. We have found that the manipulation is feasible below 40 K but not above 40 K. This temperature dependence is quite similar to the recent result observed by low-energy electron diffraction (LEED), which was viewed as an order-disorder phase transition of the Si(100) surface below 40 K. From the similarity of both phenomenon occurring at 40 K, we conclude that the order-disorder phase transition is induced by energetic electron irradiation onto the Si(100) surface during the LEED analysis. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:767 / 771
页数:5
相关论文
共 50 条
  • [41] Surface EXAFS study of the p4g(2 x 2) reconstruction of C on Ni(100) and C on Ni films
    Wende, H
    Chauvistré, R
    Haack, N
    Ceballos, G
    Wilhelm, F
    Baberschke, K
    Srivastava, P
    Arvanitis, D
    SURFACE SCIENCE, 2000, 465 (03) : 187 - 197
  • [42] LEED CRYSTALLOGRAPHIC STUDIES FOR THE RH(100)-P(2X2)-S AND RH(100)-C(2X2)-S SURFACE-STRUCTURES
    LIU, W
    LOU, JR
    MITCHELL, KAR
    SURFACE SCIENCE, 1993, 281 (1-2) : 21 - 32
  • [43] STM observation of the 2 x 3 and c(2 x 6) structures on Ba/Si(100)
    Ojima, K
    Yoshimura, M
    Ueda, K
    SURFACE SCIENCE, 2001, 491 (1-2) : 169 - 174
  • [44] Decomposition of C60 molecules on Si(100)(2 x 1) surface
    Erkoç, S
    Katircioglu, S
    INTERNATIONAL JOURNAL OF MODERN PHYSICS C, 2000, 11 (05): : 1067 - 1076
  • [45] Multiple Pathways for Dissociative Adsorption of SiCl4 on the Si(100)-c(4x2) Surface
    Zhang, Jianxun
    Zhu, Quan
    Li, Jun
    SYMMETRY-BASEL, 2023, 15 (01):
  • [46] Bi-induced (2 x 6), (2 x 8), and (2 x 4) reconstructions on the InAS(100) surface
    Laukkanen, P
    Ahola, M
    Kuzmin, M
    Perälä, RE
    Väyrynen, IJ
    Sadowski, J
    SURFACE SCIENCE, 2005, 598 (1-3) : L361 - L367
  • [47] Adsorption of TiCl4 on H/Si(100)-2 x 1 Surface
    Ghosh, Manik Kumer
    Choi, Cheol Ho
    CHEMICAL PHYSICS LETTERS, 2008, 461 (4-6) : 249 - 253
  • [48] Multi-scale modeling of oxygen molecule adsorption on a Si(100)-p(2 x 2) surface
    Hemeryck, A.
    Richard, N.
    Esteve, A.
    Rouhani, M. Djafari
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2007, 353 (5-7) : 594 - 598
  • [49] Metallization of the potassium overlayer on the β-SiC(100) c(4 x 2) surface
    Haycock, Barry J.
    Trabada, Daniel G.
    Ortega, Jose
    O'Mahony, J. D.
    Lewis, J. P.
    JOURNAL OF PHYSICS-CONDENSED MATTER, 2012, 24 (48)
  • [50] Isolated benzene and dichlorobenzene on the Ge(100)-c(4 x 2) surface
    Puchalska, A.
    Jurczyszyn, L.
    Stankiewicz, B.
    Radny, M. W.
    APPLIED SURFACE SCIENCE, 2014, 304 : 96 - 102