Study of microstructure and gas sensing properties of tin oxide thin films prepared by metal organic chemical vapor deposition

被引：0
|
作者：
Lee, SW [1 ]
Liu, DH [1 ]
Tsai, PP [1 ]
Chen, H [1 ]
机构：
[1] UNIV ILLINOIS,DEPT MAT SCI & ENGN,URBANA,IL 61801
来源：
METAL-ORGANIC CHEMICAL VAPOR DEPOSITION OF ELECTRONIC CERAMICS II | 1996年 / 415卷
关键词：
D O I：
暂无
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：237 / 242
页数：6
相关论文
共 50 条
  • [31] Precursor oxidation state control of film stoichiometry in the metal-organic chemical vapor deposition of tin oxide thin films
    Suh, S
    Hoffman, DM
    Atagi, LM
    Smith, DC
    Liu, JR
    Chu, WK
    CHEMISTRY OF MATERIALS, 1997, 9 (03) : 730 - 735
  • [32] Deposition of tin oxide, iridium and iridium oxide films by metal-organic chemical vapor deposition for electrochemical wastewater treatment
    Klamklang, Songsak
    Vergnes, Hugues
    Senocq, Francois
    Pruksathorn, Kejvalee
    Duverneuil, Patrick
    Damronglerd, Somsak
    JOURNAL OF APPLIED ELECTROCHEMISTRY, 2010, 40 (05) : 997 - 1004
  • [33] Deposition of tin oxide, iridium and iridium oxide films by metal-organic chemical vapor deposition for electrochemical wastewater treatment
    Songsak Klamklang
    Hugues Vergnes
    François Senocq
    Kejvalee Pruksathorn
    Patrick Duverneuil
    Somsak Damronglerd
    Journal of Applied Electrochemistry, 2010, 40 : 997 - 1004
  • [34] ELECTROCHROMIC PROPERTIES OF MANGANESE OXIDE THIN-FILMS PREPARED BY CHEMICAL-VAPOR-DEPOSITION
    MARUYAMA, T
    OSAKI, Y
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1995, 142 (09) : 3137 - 3141
  • [35] ELECTROCHROMIC PROPERTIES OF NIOBIUM OXIDE THIN-FILMS PREPARED BY CHEMICAL-VAPOR-DEPOSITION
    MARUYAMA, T
    KANAGAWA, T
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1994, 141 (10) : 2868 - 2871
  • [36] Growth of gallium oxide thin films on silicon by the metal organic chemical vapor deposition method
    Kim, HW
    Kim, NH
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2004, 110 (01): : 34 - 37
  • [37] Metal-organic chemical vapor deposition and nanoscale characterization of zirconium oxide thin films
    Harasek, S
    Wanzenboeck, HD
    Basnar, B
    Smoliner, J
    Brenner, J
    Stoeri, H
    Gornik, E
    Bertagnolli, E
    THIN SOLID FILMS, 2002, 414 (02) : 199 - 204
  • [38] GROWTH AND CHARACTERIZATION OF TIN OXIDE-FILMS PREPARED BY CHEMICAL VAPOR-DEPOSITION
    SANON, G
    RUP, R
    MANSINGH, A
    THIN SOLID FILMS, 1990, 190 (02) : 287 - 301
  • [39] Metallorganic chemical vapor deposition of complex metal oxide thin films by liquid source chemical vapor deposition
    Van Buskirk, Peter C.
    Bilodeau, Steve M.
    Roeder, Jeffrey F.
    Kirlin, Peter S.
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1996, 35 (4 B): : 2520 - 2525
  • [40] Metalorganic chemical vapor deposition of complex metal oxide thin films by liquid source chemical vapor deposition
    VanBuskirk, PC
    Bilodeau, SM
    Roeder, JF
    Kirlin, PS
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1996, 35 (4B): : 2520 - 2525
12345