Will Reliability Limit Moore's Law?

被引：0

作者：

Oates, Anthony S. ^{[1
]}

机构：

[1] TSMC Ltd, 168 Pk Ave 2,Hsinchu Sci Pk, Hsinchu 30075, Taiwan

来源：

2014 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM) | 2014年

关键词：

BREAKDOWN;

D O I：

暂无

中图分类号：

TP301 [理论、方法];

学科分类号：

081202 ;

摘要：

Up to the present time reliability has not limited the rapid evolution of Si process technologies. However, the near future will bring a continual stream of innovations in transistor architecture and gate dielectric and interconnect materials. Maintaining historical high levels of reliability in this environment will be challenging. In this paper we discuss the reliability issues that have the potential to limit the future pace of technology progress.

引用

页数：4

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