Study on silicidation reaction of Fe nanodots with SiH4

被引：1
|
作者：
Furuhata, Hiroshi [1 ]
Makihara, Katsunori [1 ]
Shimura, Yosuke [2 ,3 ]
Fujimori, Shuntaro [1 ]
Imai, Yuki [1 ]
Ohta, Akio [1 ]
Taoka, Noriyuki [1 ]
Miyazaki, Seiichi [1 ]
机构：
[1] Nagoya Univ, Grad Sch Engn, Nagoya, Aichi 4648603, Japan
[2] Shizuoka Univ, Grad Sch Integrated Sci & Technol, Hamamatsu, Shizuoka 4328011, Japan
[3] Res Inst Elect, Hamamatsu, Shizuoka 4328011, Japan
来源：
APPLIED PHYSICS EXPRESS | 2022年 / 15卷 / 05期
关键词：
nanodots; Fe silicide; beta-FeSi2; CVD; OPTICAL-ABSORPTION; EPITAXIAL-GROWTH; BETA-FESI2; PHOTOLUMINESCENCE; TEMPERATURE; PLASMA; ELECTROLUMINESCENCE; IMPLANTATION;
D O I：
10.35848/1882-0786/ac6727
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We have demonstrated the formation of Fe-silicide nanodots (NDs) on SiO2 by exposing Fe NDs to SiH4. The Fe NDs were formed by exposing ultrathin Fe film deposited on SiO2 to remote H-2-plasma. After SiH4 exposure at 400 degrees C, formation of Fe-silicide NDs with an areal dot density over 10(11) cm(-2) was confirmed. Photoluminescence from the Fe-silicide NDs was observable at room temperature in the near-infrared, being attributed to radiative recombination between quantized states in the NDs. The results will lead to the development of Si-based light-emitting devices that are highly compatible with Si ultralarge-scale-integration processing. (C) 2022 The Japan Society of Applied Physics
引用
收藏
页数：4
相关论文
共 50 条
  • [21] Nonadiabatic dynamics of C(3P)+SiH4 reaction
    Chang, Agnes
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2017, 253
  • [22] AL(2P)(SIH4) COMPLEX AND PHOTOREVERSIBLE OXIDATIVE ADDITION REDUCTIVE ELIMINATION-REACTION AL(2P)(SIH4) REVERSIBLE SIH3ALH .2. AL(2P)(SIH4) REVERSIBLE SIH3ALH REACTION
    LEFCOURT, MA
    OZIN, GA
    JOURNAL OF PHYSICAL CHEMISTRY, 1991, 95 (07): : 2623 - 2628
  • [23] ABSORPTION OF SIH4 IN EXTREME ULTRAVIOLET
    HAYES, W
    BROWN, FC
    KUNZ, AB
    PHYSICAL REVIEW LETTERS, 1971, 27 (12) : 774 - &
  • [24] The structure of SiH4 solid phases
    Prokhvatilov, A.I.
    Galtsov, N.N.
    Klimenko, N.A.
    Strzhemechny, M.A.
    Fizika Nizkikh Temperatur (Kharkov), 2008, 34 (02): : 185 - 196
  • [25] VIBRATIONAL DEPHASING IN LIQUID SIH4
    WILDE, RE
    CHANG, TC
    MOLECULAR PHYSICS, 1984, 53 (02) : 493 - 504
  • [26] Structure of the solid phases of SiH4
    Prokhvatilov, A. I.
    Galtsov, N. N.
    Klimenko, N. A.
    Strzhemechny, M. A.
    LOW TEMPERATURE PHYSICS, 2008, 34 (02) : 142 - 151
  • [27] OXIDIZED SIH4 AS A DIFFUSION SOURCE
    MECS, BM
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (03) : C70 - &
  • [28] SiH4的制造方法
    八(金刄)吉文
    林良一
    韩美
    低温与特气, 1986, (04) : 20 - 25
  • [29] SiH4 adsorption on SiGe(001)
    Hirose, F.
    Shinohara, M.
    Kimura, Y.
    Niwano, M.
    SURFACE SCIENCE, 2007, 601 (04) : 1123 - 1128
  • [30] MAGNETIC-PROPERTIES OF R(2)FE(17) TREATED WITH SIH4
    BRENNAN, S
    QI, QN
    COEY, JMD
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1995, 140 : 977 - 978
12345