Assessment of waveguide thermal response by interrogation of UV written planar gratings

被引：1
|
作者：
Sparrow, IJG [1 ]
Emmerson, GD
Gawith, CBE
Watts, SP
Williams, RB
Smith, PGR
机构：
[1] Univ Southampton, Optoelect Res Ctr, Southampton SO17 1BJ, Hants, England
[2] Stratophase Ltd, Romsey SO51 9AQ, Hants, England
来源：
IEEE PHOTONICS TECHNOLOGY LETTERS | 2005年 / 17卷 / 02期
关键词：
gratings; integrated optics; photothermal effects; planar waveguides; rapid thermal processing;
D O I：
10.1109/LPT.2004.839457
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The technique of direct grating writing, based on direct ultraviolet writing, is demonstrated as a tool for highly accurate measurement of waveguide and material properties. Silica-on-silicon planar samples are processed using hydrogen loading and thermal locking before Bragg channel waveguides are defined in the photosensitive core layer. The refractive index is accurately probed to compare different thermal locking Procedures and characterize waveguide thermal stability.
引用
收藏
页码：438 / 440
页数：3
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