Structural, Optical, and Electrical Properties of Thin Films of Bismuth Tri-Iodide

被引:1
|
作者
Garg, Alka [1 ]
Tomar, Monika [2 ]
Gupta, Vinay [3 ]
机构
[1] Univ Delhi, Gargi Coll, New Delhi 110049, India
[2] Univ Delhi, Delhi 110007, India
[3] Univ Delhi, Dept Phys & Astrophys, EMDL Lab, Delhi 110007, India
关键词
Bismuth Tri-Iodide Films; XRD; Optical Studies; Surface Morphology; I-V Characteristics;
D O I
10.1166/asl.2014.5505
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Bismuth Iodide is a potentially active semiconductor material for room temperature radiation detector. Thus films of Bismuth tri-iodide are grown on both glass and platinised silicon substrate at room temperature by thermal evaporation technique to study its structural, optical, and electrical properties. Films are characterized by XRD and SEM to ascertain its quality. The optical transmission spectra shows high absorption in the visible region and optical band gap shows thickness dependence. Electrical properties were measured in MIM configuration and films show high resistivity, a prerequisite parameter for film to act as radiation detector.
引用
收藏
页码:1442 / 1445
页数:4
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