Morphology-to-properties correlations in anodic porous InP layers

被引:2
|
作者
Santinacci, Lionel [1 ]
Goncalves, Anne-Marie [1 ]
Bouttemy, Muriel [1 ]
Etcheberry, Arnaud [1 ]
机构
[1] Univ Versailles St Quentin, CNRS, Inst Lavoisier Versailles, UMR 8180, F-78035 Versailles, France
关键词
III-V semiconductors; Porous materials; Anodic films; Nanostructured materials; ELECTROCHEMICAL PORE FORMATION; N-INP; ELECTROLYTE INTERFACE; FORMATION MECHANISM; SEMICONDUCTORS; SILICON; GAP; EFFICIENCY; CRYSTALS; SURFACES;
D O I
10.1007/s10008-009-0942-y
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
In this paper, we investigate the properties of porous structures anodically grown onto n-InP (100) in HCl. In situ electrochemical characterizations show the pore morphology strongly influences the properties of the InP surfaces. Both dc- and ac-electrochemical measurements reveal an enhancement of the capacitive current and a modification of the electronic distribution at the interface. Photocurrent spectra performed during the pore growth are also strongly modified. For low anodic charges, an increase of the photocurrent with a redshift of the absorption edge is measured. These evolutions can be respectively ascribed (i) to a reflection decrease due to a surface roughening and (ii) to the creation of surface states within the band gap. For higher anodic charges, the photocurrent drops with a narrowing of the spectrum. Using a model based on the "dead" layer, the porous layer is considered as an absorbent film that progressively attenuates the photocurrent of the bulk semiconductor.
引用
收藏
页码:1177 / 1184
页数:8
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