A molecular dynamics study of nanoindentation of amorphous silicon carbide

被引:33
|
作者
Szlufarska, Izabela
Kalia, Rajiv K.
Nakano, Aiichiro
Vashishta, Priya
机构
[1] Univ Wisconsin, Dept Mat Sci & Engn, Madison, WI 53706 USA
[2] Univ So Calif, Collaboratory Adv Comp & Simulat, Los Angeles, CA 90089 USA
[3] Univ So Calif, Dept Mat Sci & Engn, Los Angeles, CA 90089 USA
[4] Univ So Calif, Dept Comp Sci, Los Angeles, CA 90089 USA
[5] Univ So Calif, Dept Phys & Astron, Los Angeles, CA 90089 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.2756059
中图分类号
O59 [应用物理学];
学科分类号
摘要
Through molecular dynamics simulation of nanoindentation of amorphous a-SiC, we have found a correlation between its atomic structure and the load-displacement (P-h) curve. We show that a density profile of a-SiC exhibits oscillations normal to the surface, analogous to liquid metal surfaces. Short-range P-h response of a-SiC is similar to that of crystalline 3C-SiC, e.g., it shows a series of load drops associated with local rearrangements of atoms. However, the load drops are less pronounced than in 3C-SiC due to lower critical stress required for rearrangement of local clusters of atoms. The nanoindentation damage is less localized than in 3C-SiC. The maximum pressure under the indenter is 60% lower than in 3C-SiC with the same system geometry. The onset of plastic deformation occurs at the depth of 0.5 angstrom, which is similar to 25% of the corresponding value in 3C-SiC. a-SiC exhibits lower damping as compared to 3C-SiC, which is reflected in the longer relaxation time of transient forces after each discrete indentation step. (C) 2007 American Institute of Physics.
引用
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页数:9
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