A new method to determine channel mobility model parameters in submicron MOSFET's using measured S-parameters

被引:2
|
作者
Lee, S [1 ]
Yu, HK [1 ]
机构
[1] Hankuk Univ Foreign Studies, Dept Elect Engn, Yongin 449791, Kyungki Do, South Korea
关键词
D O I
10.1109/SISPAD.2000.871256
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new method based on the slope extraction of the total gate charge versus mask gate length from measured S-parameters is developed to determine effective channel mobility model parameters directly from submicron MOSFET's. Since this method does not require a large test device, parasitic capacitance calibration, or the effective channel length measurement, it is simpler and more accurate than traditional methods.
引用
收藏
页码:253 / 256
页数:4
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