Transmission electron microscopy of indium gallium nitride nanorods grown by molecular beam epitaxy

被引:3
|
作者
Webster, Richard F. [1 ]
Cherns, David [1 ]
Novikov, Sergei V. [2 ]
Foxon, C. Thomas [2 ]
机构
[1] Univ Bristol, HH Wills Phys Lab, Tyndall Ave, Bristol BS2 1TL, Avon, England
[2] Univ Nottingham, Sch Phys & Astron, Nottingham NG7 2RD, England
基金
英国工程与自然科学研究理事会;
关键词
InGaN nanorods; solar cells; MBE; TEM; INGAN; DEPOSITION; LAYERS; WELL;
D O I
10.1002/pssc.201300454
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
This paper demonstrates the growth of InGaN nanorods and lateral growth over nanorod arrays using molecular beam epitaxy. It is shown that nitrogen rich growth conditions result in a nanorod array and that, by changing to metal rich conditions, lateral growth may be enhanced to coalesce the nanorods into a continuous overgrown film. Energy dispersive X-ray spectroscopy has been used to demonstrate that the nanorods display a core-shell structure with In-rich cores and In-poor edges. Transmission Electron Microscopy has shown that the nanorods are free of dislocations. However, when lateral growth occurs basal plane stacking faults are generated. It is shown that this stacking fault generation leads to a change in structure from hexagonal to cubic. When coalescence has occurred large angle grain boundaries are present. (C) 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:417 / 420
页数:4
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