共 45 条
- [21] Carbon contamination of EUV mask and its effect on CD performanceCURRENT APPLIED PHYSICS, 2011, 11 (04) : S107 - S110Lee, Sangsul论文数: 0 引用数: 0 h-index: 0机构: Hanyang Univ, Dept Mat Sci & Engn, Seoul 133791, South Korea Hanyang Univ, Dept Mat Sci & Engn, Seoul 133791, South KoreaDoh, Jong Gul论文数: 0 引用数: 0 h-index: 0机构: Hanyang Univ, Dept Mat Sci & Engn, Seoul 133791, South Korea Hanyang Univ, Dept Mat Sci & Engn, Seoul 133791, South KoreaLee, Jae Uk论文数: 0 引用数: 0 h-index: 0机构: Hanyang Univ, Dept Mat Sci & Engn, Seoul 133791, South Korea Hanyang Univ, Dept Mat Sci & Engn, Seoul 133791, South KoreaLee, Inhwan论文数: 0 引用数: 0 h-index: 0机构: Hanyang Univ, Dept Mat Sci & Engn, Seoul 133791, South Korea Hanyang Univ, Dept Mat Sci & Engn, Seoul 133791, South KoreaJeong, Chang Young论文数: 0 引用数: 0 h-index: 0机构: Hanyang Univ, Dept Mat Sci & Engn, Seoul 133791, South KoreaLee, Dong Gun论文数: 0 引用数: 0 h-index: 0机构: Hanyang Univ, Dept Mat Sci & Engn, Seoul 133791, South KoreaRah, Seung-yu论文数: 0 引用数: 0 h-index: 0机构: Pohang Light Source, Pohang, South Korea Hanyang Univ, Dept Mat Sci & Engn, Seoul 133791, South KoreaAhn, Jinho论文数: 0 引用数: 0 h-index: 0机构: Hanyang Univ, Dept Mat Sci & Engn, Seoul 133791, South Korea Hanyang Univ, Dept Mat Sci & Engn, Seoul 133791, South Korea
- [22] Development status and infrastructure progress update of Aerial imaging Measurements on EUV MasksPHOTOMASK TECHNOLOGY 2011, 2011, 8166Perlitz, Sascha论文数: 0 引用数: 0 h-index: 0机构: Carl Zeiss SMS GmbH, D-07740 Jena, Germany Carl Zeiss SMS GmbH, D-07740 Jena, GermanyHarnisch, Wolfgang论文数: 0 引用数: 0 h-index: 0机构: Carl Zeiss SMS GmbH, D-07740 Jena, Germany Carl Zeiss SMS GmbH, D-07740 Jena, GermanyStroessner, Ulrich论文数: 0 引用数: 0 h-index: 0机构: Carl Zeiss SMS GmbH, D-07740 Jena, Germany Carl Zeiss SMS GmbH, D-07740 Jena, GermanyPeters, Jan Hendrik论文数: 0 引用数: 0 h-index: 0机构: Carl Zeiss SMS GmbH, D-07740 Jena, Germany Carl Zeiss SMS GmbH, D-07740 Jena, GermanyWeiss, Markus论文数: 0 引用数: 0 h-index: 0机构: Carl Zeiss SMS GmbH, D-07740 Jena, GermanyHellweg, Dirk论文数: 0 引用数: 0 h-index: 0机构: Carl Zeiss SMS GmbH, D-07740 Jena, Germany
- [23] Novel EUV Mask Black Border and its Impact on Wafer ImagingEXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VII, 2016, 9776Kodera, Yutaka论文数: 0 引用数: 0 h-index: 0机构: Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, Japan Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, JapanFukugami, Norihito论文数: 0 引用数: 0 h-index: 0机构: Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, Japan Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, JapanKomizo, Toru论文数: 0 引用数: 0 h-index: 0机构: Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, Japan Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, JapanWatanabe, Genta论文数: 0 引用数: 0 h-index: 0机构: Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, Japan Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, JapanIto, Shin论文数: 0 引用数: 0 h-index: 0机构: Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, Japan Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, JapanYoshida, Itaru论文数: 0 引用数: 0 h-index: 0机构: Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, Japan Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, JapanMaruyama, Shingo论文数: 0 引用数: 0 h-index: 0机构: Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, Japan Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, JapanKotani, Jun论文数: 0 引用数: 0 h-index: 0机构: Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, Japan Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, JapanKonishi, Toshio论文数: 0 引用数: 0 h-index: 0机构: Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, Japan Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, JapanHaraguchi, Takashi论文数: 0 引用数: 0 h-index: 0机构: Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, Japan Toppan Printing Co Ltd, 7-21-33 Nobidome, Niiza, Saitama 3528562, Japan
- [24] Mask Process Correction (MPC) modeling and its application to EUV mask for Electron beam mask writer, EBM-7000PHOTOMASK TECHNOLOGY 2010, 2010, 7823Kamikubo, Takashi论文数: 0 引用数: 0 h-index: 0机构: NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, Japan NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, JapanOhnishi, Takayuki论文数: 0 引用数: 0 h-index: 0机构: NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, Japan NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, JapanHara, Shigehiro论文数: 0 引用数: 0 h-index: 0机构: NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, Japan NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, JapanAnze, Hirohito论文数: 0 引用数: 0 h-index: 0机构: NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, Japan NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, JapanHattori, Yoshiaki论文数: 0 引用数: 0 h-index: 0机构: NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, Japan NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, JapanTamamushi, Shuichi论文数: 0 引用数: 0 h-index: 0机构: NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, Japan NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, JapanBai, Shufeng论文数: 0 引用数: 0 h-index: 0机构: Brion Technol Inc, Santa Clara, CA 95054 USA NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, JapanWang, Jen-Shiang论文数: 0 引用数: 0 h-index: 0机构: Brion Technol Inc, Santa Clara, CA 95054 USA NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, JapanHowell, Rafael论文数: 0 引用数: 0 h-index: 0机构: Brion Technol Inc, Santa Clara, CA 95054 USA NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, JapanChen, George论文数: 0 引用数: 0 h-index: 0机构: Brion Technol Inc, Santa Clara, CA 95054 USA NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, JapanLi, Jiangwei论文数: 0 引用数: 0 h-index: 0机构: Brion Technol Inc, Santa Clara, CA 95054 USA NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, JapanTao, Jun论文数: 0 引用数: 0 h-index: 0机构: Brion Technol Inc, Santa Clara, CA 95054 USA NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, JapanWiley, Jim论文数: 0 引用数: 0 h-index: 0机构: Brion Technol Inc, Santa Clara, CA 95054 USA NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, JapanKurosawa, Terunobu论文数: 0 引用数: 0 h-index: 0机构: Brion Technol KK, Shinagawa, Tokyo 1400001, Japan NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, JapanSaito, Yasuko论文数: 0 引用数: 0 h-index: 0机构: Brion Technol KK, Shinagawa, Tokyo 1400001, Japan NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, JapanTakigawa, Tadahiro论文数: 0 引用数: 0 h-index: 0机构: Brion Technol KK, Shinagawa, Tokyo 1400001, Japan NuFlare Technol Inc, Isogo Ku, 8 Shinsugita Cho, Yokohama, Kanagawa 2350032, Japan
- [25] Impact of EUV Multilayer Mask Defects on Imaging Performance and its Correction MethodsINTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2019, 2019, 11147Hao, Yunyun论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, 3 Bei Tu Cheng West Rd, Beijing, Peoples R China Chinese Acad Sci, Inst Microelect, 3 Bei Tu Cheng West Rd, Beijing, Peoples R ChinaDong, Lisong论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, 3 Bei Tu Cheng West Rd, Beijing, Peoples R China Chinese Acad Sci, Inst Microelect, 3 Bei Tu Cheng West Rd, Beijing, Peoples R ChinaChen, Xi论文数: 0 引用数: 0 h-index: 0机构: Beijing Univ Posts & Telecommun, 10 Xi Tu Cheng Rd, Beijing 100876, Peoples R China Chinese Acad Sci, Inst Microelect, 3 Bei Tu Cheng West Rd, Beijing, Peoples R ChinaChen, Rui论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, 3 Bei Tu Cheng West Rd, Beijing, Peoples R China Chinese Acad Sci, Inst Microelect, 3 Bei Tu Cheng West Rd, Beijing, Peoples R China论文数: 引用数: h-index:机构:Wei, Yayi论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, 3 Bei Tu Cheng West Rd, Beijing, Peoples R China Univ Chinese Acad Sci, 19 Yu Quan Rd, Beijing 100049, Peoples R China Chinese Acad Sci, Inst Microelect, 3 Bei Tu Cheng West Rd, Beijing, Peoples R ChinaYe, Tianchun论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Inst Microelect, 3 Bei Tu Cheng West Rd, Beijing, Peoples R China Univ Chinese Acad Sci, 19 Yu Quan Rd, Beijing 100049, Peoples R China Chinese Acad Sci, Inst Microelect, 3 Bei Tu Cheng West Rd, Beijing, Peoples R China
- [26] EUV simulation extension study for mask shadowing effect and its correction.EMERGING LITHOGRAPHIC TECHNOLOGIES XII, PTS 1 AND 2, 2008, 6921Kang, Hoyoung论文数: 0 引用数: 0 h-index: 0机构: ASML Korea, TDC, 372 Chung Ri Dongtan Myun Hwasung Si, Gyunggi Do, South Korea ASML Korea, TDC, 372 Chung Ri Dongtan Myun Hwasung Si, Gyunggi Do, South KoreaHansen, Steve论文数: 0 引用数: 0 h-index: 0机构: ASML US, TDC, Tempe, AZ 85284 USA ASML Korea, TDC, 372 Chung Ri Dongtan Myun Hwasung Si, Gyunggi Do, South Koreavan Schoot, Jan论文数: 0 引用数: 0 h-index: 0机构: ASML, DE Imaging, Veldhoven, Netherlands ASML Korea, TDC, 372 Chung Ri Dongtan Myun Hwasung Si, Gyunggi Do, South KoreaSchenau, Koen van Ingen论文数: 0 引用数: 0 h-index: 0机构: ASML, DE Imaging, Veldhoven, Netherlands ASML Korea, TDC, 372 Chung Ri Dongtan Myun Hwasung Si, Gyunggi Do, South Korea
- [27] Mask error and its contribution to OPC model error for an EUV via layerINTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023, 2023, 12750Lyons, Adam论文数: 0 引用数: 0 h-index: 0机构: ASML Brion, 80 W Tasman Dr, San Jose, CA 95134 USA ASML Brion, 80 W Tasman Dr, San Jose, CA 95134 USAWallow, Tom论文数: 0 引用数: 0 h-index: 0机构: ASML Brion, 80 W Tasman Dr, San Jose, CA 95134 USA ASML Brion, 80 W Tasman Dr, San Jose, CA 95134 USASpence, Chris论文数: 0 引用数: 0 h-index: 0机构: ASML Brion, 80 W Tasman Dr, San Jose, CA 95134 USA ASML Brion, 80 W Tasman Dr, San Jose, CA 95134 USAConnolly, Brid论文数: 0 引用数: 0 h-index: 0机构: Toppan Photomask Co, 80 W Tasman Dr, San Jose, CA 95134 USA ASML Brion, 80 W Tasman Dr, San Jose, CA 95134 USABuergel, Christian论文数: 0 引用数: 0 h-index: 0机构: AMTC Dresden, 80 W Tasman Dr, San Jose, CA 95134 USA ASML Brion, 80 W Tasman Dr, San Jose, CA 95134 USABender, Markus论文数: 0 引用数: 0 h-index: 0机构: AMTC Dresden, 80 W Tasman Dr, San Jose, CA 95134 USA ASML Brion, 80 W Tasman Dr, San Jose, CA 95134 USA
- [28] Evaluation of Local CD and Placement Distribution on EUV Mask and its Impact on WaferXXVI SYMPOSIUM ON PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY (PHOTOMASK JAPAN 2019), 2019, 11178Vaenkatesan, Vidya论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, Netherlands ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, Netherlandsvan Adrichem, Paul论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, Netherlands ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, NetherlandsKooiman, Marleen论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, Netherlands ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, NetherlandsKubis, Michael论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, Netherlands ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, Netherlandsvan Look, Lieve论文数: 0 引用数: 0 h-index: 0机构: IMEC, Kapeldreef 75, B-3001 Heverlee, Belgium ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, NetherlandsFrommhold, Andreas论文数: 0 引用数: 0 h-index: 0机构: IMEC, Kapeldreef 75, B-3001 Heverlee, Belgium ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, NetherlandsGallagher, Emily论文数: 0 引用数: 0 h-index: 0机构: IMEC, Kapeldreef 75, B-3001 Heverlee, Belgium ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, NetherlandsNam, D. S.论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, Netherlands ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, NetherlandsMulkens, Jan论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, Netherlands ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, NetherlandsFinders, Jo论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, Netherlands ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, NetherlandsRispens, Gijsbert论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, Netherlands ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, Netherlands
- [29] Monte Carlo sensitivity analysis of EUV mask reflectivity and its impact on OPC accuracyEXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VIII, 2017, 10143Chen, Yulu论文数: 0 引用数: 0 h-index: 0机构: GLOBALFOUNDRIES, 257 Fuller Rd, Albany, NY 12203 USA GLOBALFOUNDRIES, 257 Fuller Rd, Albany, NY 12203 USAWood, Obert论文数: 0 引用数: 0 h-index: 0机构: GLOBALFOUNDRIES, 257 Fuller Rd, Albany, NY 12203 USA GLOBALFOUNDRIES, 257 Fuller Rd, Albany, NY 12203 USARankin, Jed论文数: 0 引用数: 0 h-index: 0机构: GLOBALFOUNDRIES, 1000 River Rd, Essex Jct, VT 05452 USA GLOBALFOUNDRIES, 257 Fuller Rd, Albany, NY 12203 USAGullikson, Eric论文数: 0 引用数: 0 h-index: 0机构: Lawrence Berkeley Natl Lab, 1 Cyclotron Rd, Berkeley, CA 94720 USA GLOBALFOUNDRIES, 257 Fuller Rd, Albany, NY 12203 USAMeyer-Ilse, Julia论文数: 0 引用数: 0 h-index: 0机构: Lawrence Berkeley Natl Lab, 1 Cyclotron Rd, Berkeley, CA 94720 USA GLOBALFOUNDRIES, 257 Fuller Rd, Albany, NY 12203 USASun, Lei论文数: 0 引用数: 0 h-index: 0机构: GLOBALFOUNDRIES, 257 Fuller Rd, Albany, NY 12203 USA GLOBALFOUNDRIES, 257 Fuller Rd, Albany, NY 12203 USAQi, Zhengqing John论文数: 0 引用数: 0 h-index: 0机构: GLOBALFOUNDRIES, 257 Fuller Rd, Albany, NY 12203 USA GLOBALFOUNDRIES, 257 Fuller Rd, Albany, NY 12203 USAGoodwin, Francis论文数: 0 引用数: 0 h-index: 0机构: GLOBALFOUNDRIES, 257 Fuller Rd, Albany, NY 12203 USA GLOBALFOUNDRIES, 257 Fuller Rd, Albany, NY 12203 USAKye, Jongwook论文数: 0 引用数: 0 h-index: 0机构: GLOBALFOUNDRIES, 2600 Great Amer Way, Santa Clara, CA 95054 USA GLOBALFOUNDRIES, 257 Fuller Rd, Albany, NY 12203 USA
- [30] THE ESA MICROGRAVITY PROGRAM AND ITS USE OF THE COLUMBUS INFRASTRUCTURESPACE TECHNOLOGY-INDUSTRIAL AND COMMERCIAL APPLICATIONS, 1990, 10 (1-2): : 81 - 92SEIBERT, G论文数: 0 引用数: 0 h-index: 0