Mask program update: SEMATECH turns its attention to EUV infrastructure

被引：0
|
作者：
Doe, P
机构：
来源：
SOLID STATE TECHNOLOGY | 2003年 / 46卷 / 02期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
下载
收藏
页码：32 / +
页数：2
相关论文
共 45 条
  • [1] SEMATECH's infrastructure for defect metrology and failure analysis to support its EUV mask defect reduction program
    Jindal, V.
    Lin, C. C.
    Harris-Jones, J.
    Kageyama, J.
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY II, 2011, 7969
  • [2] SEMATECH achieves breakthrough defect reduction in EUV mask blanks
    不详
    SOLID STATE TECHNOLOGY, 2014, 57 (04) : 5 - +
  • [3] EUV mask infrastructure challenges
    Wurm, Stefan
    Seidel, Phil
    Van Peski, Chris
    He, Long
    Han, Hakseung
    Kearney, Pat
    Cho, Wonil
    EMLC 2007: 23RD EUROPEAN MASK AND LITHOGRAPHY CONFERENCE, 2007, 6533
  • [4] SEMATECH reports EUV lithography mask defect, cleaning breakthroughs
    不详
    SOLID STATE TECHNOLOGY, 2012, 55 (08) : 6 - 7
  • [5] SEMATECH's world class EUV mask blank metrology toolset
    Seo, SC
    Cavelaars, J
    Maltabes, J
    Han, SI
    Kearney, P
    Krick, D
    Metrology, Inspection, and Process Control for Microlithography XIX, Pts 1-3, 2005, 5752 : 893 - 903
  • [6] EUV Mask Infrastructure and Actinic Pattern Mask Inspection
    Liang, Ted
    Tezuka, Yoshihiro
    Jager, Marieke
    Chakravorty, Kishore
    Sayan, Safak
    Frendberg, Eric
    Satyanarayana, Srinath
    Ghadiali, Firoz
    Zhang, Guojing
    Abboud, Frank
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XI, 2020, 11323
  • [7] Contributions to EUV mask metrology infrastructure
    Farahzadi, Azadeh
    Lebert, Rainer
    Benk, Markus
    Juschkin, Larissa
    Herbert, Stefan
    Maryasov, Aleksey
    26TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE, 2010, 7545
  • [8] SEMATECH's EUV program: A key enabler for EUVL introduction
    Wurm, Stefan
    Jeon, Chan-Uk
    Lercel, Michael
    EMERGING LITHOGRAPHIC TECHNOLOGIES XI, PTS 1 AND 2, 2007, 6517
  • [9] The EUV program at ASML:: an update
    Meiling, H
    Banine, V
    Kürz, P
    Blum, B
    Heerens, GJ
    Harned, N
    EMERGING LITHOGRAPHIC TECHNOLOGIES VII, PTS 1 AND 2, 2003, 5037 : 24 - 35
  • [10] EUV mask infrastructure readiness and gaps for TD and HVM
    Liang, Ted
    Magana, John
    Chakravorty, Kishore
    Panning, Eric
    Zhang, Guojing
    PHOTOMASK TECHNOLOGY 2015, 2015, 9635
12345