Influence of thermal annealing on optical properties and surface morphology of NiOx thin films

被引：8
|
作者：
Zhou, Ying [1 ]
Geng, Yongyou [1 ]
Gu, Donghong [1 ]
机构：
[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab High Dens Opt Storage, Shanghai 201800, Peoples R China
来源：
MATERIALS LETTERS | 2007年 / 61卷 / 11-12期
关键词：
NiOx films; annealing; optical properties; surface morphology; optical recording;
D O I：
10.1016/j.matlet.2006.09.041
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
NiOx thin films were deposited by reactive DC-magnetron sputtering from a nickel metal target in Ar + O-2 with the relative O-2 content of 5%. Thermal annealing effects on optical properties and surface morphology of NiOx, films were investigated by X-ray photoelectron spectroscopy, thermogravimetric analysis, scanning electron microscope and optical measurement. The results showed that the changes in optical properties and surface morphology depended on the temperature. The surface morphology of the films changed obviously as the annealing temperature increased due to the reaction NiOx -> NiO + O-2 releasing O-2. The surface morphology change was responsible for the variation of the optical properties of the films. The optical contrast between the as-deposited films and 400 degrees C annealed films was about 52%. In addition, the relationship of the optical energy band gap with the variation of annealing temperature was studied. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码：2482 / 2485
页数：4
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