Improved n-Type 4H-SiC Epitaxial Radiation Detectors by Edge Termination

被引:22
|
作者
Nguyen, Khai V. [1 ]
Mannan, Mohammad A. [2 ]
Mandal, Krishna C. [1 ]
机构
[1] Univ S Carolina, Dept Elect Engn, Columbia, SC 29208 USA
[2] Intel Corp, Portland Technol Dev, Hillsboro, OR 97129 USA
关键词
4H-SiC; deep level transient spectroscopy; edge termination; epitaxial layer; Schottky barrier detector; DEEP LEVELS; SUBSTRATE;
D O I
10.1109/TNS.2015.2496902
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new edge termination with SiO2 and Si3N4 passivating layers has been developed and is shown to be a very effective method for improving energy resolution of 20 mu m n-type 4H-SiC epilayer Schottky barrier radiation detectors. The junction properties of the fabricated detectors before and after edge termination were studied by current-voltage (I-V) and capacitance-voltage (C-V) measurements. A thermionic emission model applied to the forward I-V characteristics showed surface barrier height of similar to 1.4 eV and diode ideality factor of similar to 1.1. The C-V measurements showed a doping concentration of 1.8 x 10(14) cm(-3) which ensured a fully depleted (similar to 20 mu m) detector at bias voltages as low as similar to 70 V. Alpha spectroscopy measurements revealed an improved energy resolution from similar to 0.7% to similar to 0.4% for 5.48 MeV alpha particles. Deep level transient spectroscopy (DLTS) measurements have shown a decreased concentration of Z(1/2) defect levels in detectors following edge termination.
引用
收藏
页码:3199 / 3206
页数:8
相关论文
共 50 条
  • [21] Highly sensitive x-ray detectors in the low-energy range on n-type 4H-SiC epitaxial layers
    Mandal, Krishna C.
    Muzykov, Peter G.
    Terry, J. Russell
    APPLIED PHYSICS LETTERS, 2012, 101 (05)
  • [22] Raman analysis of defects in n-type 4H-SiC
    杨银堂
    韩茹
    王平
    Chinese Physics B, 2008, 17 (09) : 3459 - 3463
  • [23] Raman analysis of defects in n-type 4H-SiC
    School of Microelectronics, Xidian University, Key Laboratory of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices, Xi'an 710071, China
    不详
    Chin. Phys., 2008, 9 (3459-3463):
  • [24] Aluminum Schottky contacts to n-type 4H-SiC
    Harrell, WR
    Zhang, JY
    Poole, KF
    JOURNAL OF ELECTRONIC MATERIALS, 2002, 31 (10) : 1090 - 1095
  • [25] Aluminum schottky contacts to n-type 4H-SiC
    William R. Harrell
    Jingyan Zhang
    Kelvin F. Poole
    Journal of Electronic Materials, 2002, 31 : 1090 - 1095
  • [26] Electroless Nickel for n-type Contact on 4H-SiC
    Mendis, Suwan P.
    Tin, Chin-Che
    Tin, Michelle T.
    Isaacs-Smith, Tamara
    Crandall, Erika R.
    SILICON CARBIDE AND RELATED MATERIALS 2011, PTS 1 AND 2, 2012, 717-720 : 837 - +
  • [27] Raman analysis of defects in n-type 4H-SiC
    Yang Yin-Tang
    Han Ru
    Wang Ping
    CHINESE PHYSICS B, 2008, 17 (09) : 3459 - 3463
  • [28] Dicarbon antisite defect in n-type 4H-SiC
    Umeda, T.
    Isoya, J.
    Morishita, N.
    Ohshima, T.
    Janzen, E.
    Gali, A.
    PHYSICAL REVIEW B, 2009, 79 (11)
  • [29] Shallow and deep levels in n-type 4H-SiC
    Evwaraye, AO
    Smith, SR
    Mitchel, WC
    JOURNAL OF APPLIED PHYSICS, 1996, 79 (10) : 7726 - 7730
  • [30] Comparison of bulk and epitaxial 4H-SiC detectors for radiation hard particle tracking
    Quinn, T
    Bates, R
    Bruzzi, M
    Cunningham, W
    Mathieson, K
    Moll, M
    Nelson, T
    Nilsson, HE
    Pintillie, I
    Reynolds, L
    Sciortino, S
    Sellin, P
    Strachan, H
    Svensson, BG
    Vaitkus, J
    Rahman, M
    2003 IEEE NUCLEAR SCIENCE SYMPOSIUM, CONFERENCE RECORD, VOLS 1-5, 2004, : 1028 - 1033