Semicrystalline high performance polymers (HPPs) exhibit desirable thermomechanical properties which make them suitable materials in several industries. However, when their mechanical characteristics are investigated at nanoscale, the inhomogeneous nature of semicrystalline HPPs results in measurement of localized properties which might not represent the overall material response. In this paper, the nanomechanics of poly(ether-ether-ketone) (PEEK) as a tough HPP is scrutinized using the nano indentation technique. It is demonstrated how surface properties of this polymer can affect the nano indentation measurements and reveal significant anomalies compared to the nanoindentation of fully crystalline or amorphous solids. In addition, polishing and annealing procedures are introduced as simple techniques that can be used for eliminating the inhomogeneity of the mechanical response of PEEK. Lastly, the capability of depth sensing indentation for determining the distribution of crystalline and amorphous sub-regions within semicrystalline solids is scrutinized and critically discussed. (C) 2017 Elsevier Ltd. All rights reserved.
机构:
Univ Vienna, Fac Phys, Res Grp Phys Nanostruct Mat, Vienna, AustriaUniv Vienna, Fac Phys, Res Grp Phys Nanostruct Mat, Vienna, Austria
Spieckermann, Florian
Wilhelm, Harald
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Univ Vienna, Fac Phys, Res Grp Phys Nanostruct Mat, Vienna, Austria
Lab Polymer Engn LKT TGM, A-1200 Vienna, AustriaUniv Vienna, Fac Phys, Res Grp Phys Nanostruct Mat, Vienna, Austria
机构:
Univ Technol Compiegne, UMR CNRS UTC 6253, Lab Roberval, BP 20529, F-60205 Compiegne, FranceUniv Technol Compiegne, UMR CNRS UTC 6253, Lab Roberval, BP 20529, F-60205 Compiegne, France
Beyaoui, M.
Mazeran, P. -E.
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Univ Technol Compiegne, UMR CNRS UTC 6253, Lab Roberval, BP 20529, F-60205 Compiegne, FranceUniv Technol Compiegne, UMR CNRS UTC 6253, Lab Roberval, BP 20529, F-60205 Compiegne, France
Mazeran, P. -E.
Bigerelle, M.
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Univ Technol Compiegne, UMR CNRS UTC 6253, Lab Roberval, BP 20529, F-60205 Compiegne, FranceUniv Technol Compiegne, UMR CNRS UTC 6253, Lab Roberval, BP 20529, F-60205 Compiegne, France
Bigerelle, M.
Guigon, M.
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Univ Technol Compiegne, UMR CNRS UTC 6253, Lab Roberval, BP 20529, F-60205 Compiegne, FranceUniv Technol Compiegne, UMR CNRS UTC 6253, Lab Roberval, BP 20529, F-60205 Compiegne, France
机构:
Univ Kentucky, Lexington, KY 40506 USAUniv Kentucky, Lexington, KY 40506 USA
Fulcher, J. T.
Lu, Y. C.
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Univ Kentucky, Lexington, KY 40506 USAUniv Kentucky, Lexington, KY 40506 USA
Lu, Y. C.
Tandon, G. P.
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USAF, Res Lab, Mat & Mfg Directorate, RXBC, Wright Patterson AFB, OH 45433 USA
Univ Dayton Res Ins, Dayton, OH 45469 USAUniv Kentucky, Lexington, KY 40506 USA
Tandon, G. P.
Foster, D. C.
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USAF, Res Lab, Mat & Mfg Directorate, RXBC, Wright Patterson AFB, OH 45433 USAUniv Kentucky, Lexington, KY 40506 USA