Antireflection coating of SiO2 thin film in dye-sensitized solar cell prepared by liquid phase deposition

被引：12
|
作者：
Chen, Chao-Nan [1 ]
Wu, Menq-Jion [2 ]
Hsu, Chun-Fa [2 ]
Huang, Jung-Jie [3 ]
机构：
[1] Asia Univ, Dept Comp Sci & Informat Engn, Taichung 41354, Taiwan
[2] Natl Changhua Univ Educ, Dept Mechatron Engn, Changhua 500, Taiwan
[3] Dayeh Univ, Dept Elect Engn, Dacun 51591, Changhua, Taiwan
来源：
SURFACE & COATINGS TECHNOLOGY | 2017年 / 320卷
关键词：
Liquid phase deposition; Antireflection coating; Dye-sensitized solar cell; HIGH-EFFICIENCY; LAYER;
D O I：
10.1016/j.surfcoat.2017.02.015
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
In this study, we present a simple method for producing SiO2 antireflection (AR) coatings functionalized photoanodes by liquid phase deposition (LPD) using a deposition solution of hydrofluosilicic acid (H2SiF6) and boric acid (H3BO3). Antireflection coatings are used in dye-sensitized solar cells (DSSCs) to grad the reflective index between the glass and air interface. The less refractive index of the LPD-SiO2 coating also helps to improve the transmittance of the AR coating, This paper presents a detailed study obtained of DSSCs, with and without this LPD-SiO2 AR coating. Measurements show a short current density gain of 25.39%. The DSSC efficiency was improved from 4.76 to 6.03% with the LPD-SiO2 AR coating. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码：28 / 33
页数：6
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