Adsorption properties of Ag2O-MoSe2 towards SF6 decomposed products

被引:56
|
作者
Liu, Hong [1 ]
Xu, Lingna [1 ]
Gui, Yingang [1 ]
Ran, Liang [2 ]
Chen, Xianping [3 ]
机构
[1] Southwest Univ, Coll Engn & Technol, Chongqing 400715, Peoples R China
[2] Chongqing Lightning Protect Ctr, Chongqing 401147, Peoples R China
[3] Chongqing Univ, Key Lab Optoelect Technol & Syst, Educ Minist China, Coll Optoelect Engn, Chongqing, Peoples R China
关键词
SF6 decomposed products; Ag2O-MoSe2; Adsorption; DFT; PARTIAL DISCHARGE RECOGNITION; DOPED MOSE2 MONOLAYER; AG; 111; MECHANISM; GRAPHENE; C2H2; CNT; CO;
D O I
10.1016/j.vacuum.2021.110248
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this study, the adsorption and gas-sensing properties of Ag2O-MoSe2 to SF6 characteristic decomposition products (H2S, SO2, SOF2 and SO2F2), have been study based on the first-principle calculations. The optimal structures, adsorption energy, band structure, density of states, differential charge density, and molecular orbital theory were used to analyze the adsorption mechanism. Results show that the adsorption capacity of Ag2O-MoSe2 to SF6 characteristic decomposition products is in following order: H2S> SO2>SO2F2>SOF2. All of the gas molecule adsorptions are exothermic, and occur spontaneously. State density analysis shows that H2S and SO2 adsorption belongs to chemical adsorption, while SOF2 and SO2F2 interact by physical adsorption. The recovery time shows that H2S is difficult to desorption after adsorption. While the desorption time of SO2 is much shorter than H2S, which improve the detection efficiency. In addition, the dissociation time of SOF2 and SO2F2 is very short. In conclusion, Ag2O-MoSe2 can be a potential gas sensing material for these four SF6 characteristic decomposition products detection.
引用
收藏
页数:8
相关论文
共 50 条
  • [41] Adsorption and sensing for SF6 decomposed gases by Pt-BN monolayer: a DFT study
    Li, Jia-Yu
    Wang, Peng
    Akram, Shakeel
    MOLECULAR PHYSICS, 2021, 119 (14)
  • [42] Adsorption and gas -sensing properties of Pt 2?GaNNTs for SF 6 decomposition products
    Cao, Wenhai
    Gui, Yingang
    Chen, Tao
    Xu, Lingna
    Ding, Zhuyu
    APPLIED SURFACE SCIENCE, 2020, 524
  • [43] SOME PECULIARITIES OF THE SF6 AND THE SF6+ O-2 DISCHARGE PLASMA
    MASEK, K
    LASKA, L
    PERINA, V
    KRASA, J
    ACTA PHYSICA SLOVACA, 1983, 33 (03) : 145 - 150
  • [44] Thermophysical properties of CF4/O2 and SF6/O2 gas mixtures
    Damyanova, M.
    Hohm, U.
    Balabanova, E.
    Barton, D.
    19TH INTERNATIONAL SUMMER SCHOOL ON VACUUM, ELECTRON AND ION TECHNOLOGIES (VEIT2015), 2016, 700
  • [45] Capacitively Coupled SF6, SF6/O-2, SF6/CH4 Plasma Etching of Acrylic at Low Vacuum Pressure
    Park, Yeon-Hyun
    Joo, Young-Woo
    Kim, Jaek-Won
    Noh, Ho-Seob
    Lee, Je-Won
    KOREAN JOURNAL OF MATERIALS RESEARCH, 2009, 19 (02): : 68 - 72
  • [46] Analysis of adsorption properties of SF6 decomposed gases (SOF2, SO2F2, SF4, CF4, and HF) on Fe-doped SWCNT: A DFT study
    Huang, Heyuan
    Yu, Yingzhe
    Zhang, Minhua
    APPLIED SURFACE SCIENCE, 2020, 505
  • [47] Etching of high aspect ratio features in Si using SF6/O2/HBr and SF6/O2/Cl2 plasma
    Gomez, S
    Belen, RJ
    Kiehlbauch, M
    Aydil, ES
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2005, 23 (06): : 1592 - 1597
  • [48] Influence of O-2 and H2O on the spark decomposition of SF6 and SF6 plus 50% CF4 mixtures
    Pradayrol, C
    Casanovas, AM
    Casanovas, J
    CONFERENCE RECORD OF THE 1996 IEEE INTERNATIONAL SYMPOSIUM ON ELECTRICAL INSULATION, VOLS 1 AND 2, 1996, : 823 - 827
  • [49] Palladium modified MoS2 monolayer for adsorption and scavenging of SF6 decomposition products: A DFT study
    Li, Tao
    Gui, Yingang
    Zhao, Wenhao
    Tang, Chao
    Dong, Xingchen
    PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 2020, 123 (123):
  • [50] Adsorption performance of Cu-MoTe2 on SF6 decomposition products: A first-principles study
    Zhang, Xiaoxing
    Luo, Yongchao
    Xu, Kai
    Liu, Weihao
    Tian, Shuangshuang
    Liu, Benli
    Wang, Jiahao
    Hu, Feng
    MATERIALS TODAY COMMUNICATIONS, 2024, 38