Developing an ultraclean pumping system for low-pressure, high-gas-flow applications

被引：0
|
作者：
Ohmi, T [1 ]
Ino, K
Sekine, K
Shibata, T
机构：
[1] Tohoku Univ, Grad Sch Engn, Dept Elect, Sendai, Miyagi 980, Japan
[2] Univ Tokyo, Dept Informat & Commun Engn, Tokyo, Japan
来源：
MICRO | 1998年 / 16卷 / 02期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：53 / 61
页数：9
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