Studies of density and surface roughness of ultrathin amorphous carbon films with regards to thickness with x-ray reflectometry and spectroscopic ellipsometry

被引：61
|
作者：
Logothetidis, S
Stergioudis, G
机构：
[1] Department of Physics, Aristotle University of Thessaloniki
来源：
APPLIED PHYSICS LETTERS | 1997年 / 71卷 / 17期
关键词：
D O I：
10.1063/1.120089
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Specular x-ray reflectivity (XRR) measurements were used to study the density and surface roughness of ultrathin hydrogen-free amorphous carbon films deposited by sputtering, of thickness varying from 25 to 325 Angstrom. The film thickness and surface roughness obtained from XRR measurements are in good agreement with that found by spectroscopic ellipsometry (SE) and atomic force microscopy. The results for the film composition obtained from SE and XRR are supported by stress measurements. Films (especially those with thickness below 100 Angstrom) deposited with positive substrate bias voltage were found to exhibit a reduction in density, sp(3) C-C bonding, and internal compressive stresses and an increase in surface roughness by increasing film thickness. (C) 1997 American Institute of Physics. [S0003-6951(97)02943-4].
引用
收藏
页码：2463 / 2465
页数：3
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