On the colloidal stability of poly(methyl methacrylate) and polystyrene particles prepared with surface-active initiators

被引:9
|
作者
Aslamazova, T. R.
Tauer, K. [1 ]
机构
[1] Max Planck Inst Colloids & Interfaces, D-14424 Potsdam, Germany
[2] Russian Acad Sci, Inst Chem Phys, Moscow, Russia
关键词
colloidal stability; polymer latexes; surface-active initiators (inisurfs);
D O I
10.1016/j.colsurfa.2007.01.049
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The stability of poly(methyl methacrylate) (PMMA) latexes prepared with surface-active initiators (inisurfs) of the 2,2'-azobis(N-2methylpropanoyl-2-amino-alkyl-1)sulfonate series (AAS) has been investigated in comparison with polystyrene (PS) dispersions. These initiators act in aqueous emulsion polymerizations two-fold as radical source to start the polymerization and as stabilizers for the colloidal particles. There exist strong correlations between the surface activity of the AAS on the one hand and the rate of polymerization and the stability of the latex particles on the other hand. For both polymers, it was found that the alkyl chain length of the inisurfs determines the zeta-potential, the hydrophilicity of the particles surfaces, and the colloidal stability of the dispersions. Moreover, the calculated barrier height of the overall interaction energy between two latex particles fits nicely with the experimentally observed stability. But also the hydrophilicity of the polymers influences the stability of the latexes. As shown by our experiments the more hydrophobic PS has a greater zeta-potential and hence, stronger repulsive forces between the polymeric particles exist compared with the more hydrophilic PMMA. (C) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:260 / 267
页数:8
相关论文
共 50 条
  • [31] Methyl methacrylate particles with amino groups on the surface: Colloid stability and sorption of biologically active substances
    Baigildin, Vadim
    Pankova, Galina
    Evseeva, Tatyana
    Lavrov, Nikolay
    Shirokova, Irina
    Vaganov, Gleb
    Shevchenko, Natalya
    JOURNAL OF DISPERSION SCIENCE AND TECHNOLOGY, 2017, 38 (11) : 1570 - 1577
  • [32] Effect of γ-ray irradiation on polystyrene, poly(methyl methacrylate), and their copolymer prepared by cast polymerization
    Tsukame, T
    Kutsuzawa, M
    Saitoh, H
    Shibasaki, Y
    KOBUNSHI RONBUNSHU, 1998, 55 (08) : 433 - 439
  • [33] Effect of Molecular Architecture of Surface-Active Organosilicon Macromers on Their Colloidal Properties in Relation to Heterophasic Radical Polymerization of Styrene and Methyl Methacrylate
    Gostenin, Valeriy Borisovich
    Shulgin, Anton Mikhailovich
    Shikhovtseva, Irina Sergeevna
    Kalinina, Alexandra Alexandrovna
    Gritskova, Inessa Alexandrovna
    Zubov, Vitaliy Pavlovich
    PHYSCHEM, 2024, 4 (01): : 78 - 90
  • [34] SOLUTION BLENDING OF POLYSTYRENE AND POLY(METHYL METHACRYLATE)
    BURNS, CM
    KIM, WN
    POLYMER ENGINEERING AND SCIENCE, 1988, 28 (21): : 1362 - 1372
  • [35] Mechanochemical modification of polystyrene and poly(methyl methacrylate)
    Frendel, A
    Drache, M
    Janke, G
    Schmidt-Naake, G
    CHEMIE INGENIEUR TECHNIK, 2000, 72 (04) : 391 - 396
  • [36] MICROHARDNESS OF BLENDS OF POLYSTYRENE AND POLY(METHYL METHACRYLATE)
    KATARE, R
    BAJPAI, R
    DATT, SC
    POLYMER TESTING, 1991, 10 (02) : 139 - 143
  • [37] MORPHOLOGY OF 2-PHASE POLYSTYRENE POLY(METHYL METHACRYLATE) LATEX-PARTICLES PREPARED UNDER DIFFERENT POLYMERIZATION CONDITIONS
    JONSSON, JEL
    HASSANDER, H
    JANSSON, LH
    TORNELL, B
    MACROMOLECULES, 1991, 24 (01) : 126 - 131
  • [38] STRENGTH OF POLYSTYRENE POLY(METHYL METHACRYLATE) INTERFACES
    FOSTER, KL
    WOOL, RP
    MACROMOLECULES, 1991, 24 (06) : 1397 - 1403
  • [39] PHOTOSENSITIZED DEGRADATION OF POLY(METHYL METHACRYLATE) AND POLYSTYRENE
    KAMINSKA, A
    KACZMAREK, H
    MODRZYNSKA, G
    POLISH JOURNAL OF CHEMISTRY, 1995, 69 (06) : 865 - 872
  • [40] Methacrylate modified clays and their polystyrene and poly(methyl methacrylate) nanocomposites
    Su, SP
    Jiang, DD
    Wilkie, CA
    POLYMERS FOR ADVANCED TECHNOLOGIES, 2004, 15 (05) : 225 - 231