New short cycle wet cleaning concept for a 300 mm fabrication line

被引：0
|
作者：
Verhaverbeke, S [1 ]
Truman, K [1 ]
机构：
[1] Appl Mat Inc, Santa Clara, CA 95054 USA
来源：
CLEANING TECHNOLOGY IN SEMICONDUCTOR DEVICE MANUFACTURING VII, PROCEEDINGS | 2002年 / 2002卷 / 26期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
A new concept for short. cycle time wet cleaning is investigated. It was found that using this concept, a typical 64 min HF-SC1-SC2 process can be reduced down to 2 min. The chemistry of this concept consists of a single step modified SC1 which replaces the dual step SC1-SC2. We have named this new cleaning concept, the AMAT clean.
引用
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页码：31 / 35
页数：5
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