Dispersion of the temperature dependence of the retardance in SiO2 and MgF2

被引:10
|
作者
Etzel, SM [1 ]
Rose, AH [1 ]
Wang, CM [1 ]
机构
[1] US Dept Commerce, Natl Inst Stand & Technol, Boulder, CO 80303 USA
关键词
D O I
10.1364/AO.39.005796
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We have directly measured the retardance versus temperature for single-crystal quartz (SiO2) and magnesium fluoride (MgF2) at wavelengths of 633, 788, 1318, and 1539 nm and over a temperature range of 24-80 degreesC. To our knowledge, the temperature dependence of retardance for these two materials has not been directly measured. We compared our direct measurements of the normalized temperature derivative of the retardance gamma with derived values from previously reported indirect measurements and found our results to be in agreement and our measurement uncertainties to be typically a factor of 4 smaller. Our overall mean value for gamma (SiO2) is -1.23 X 10(-4) with a combined standard uncertainty of 0.02 X 10(-4) and little wavelength dependence over the 633-1539-nm range. Our overall mean value for gamma (MgF2) is -5.37 X 10(-5) with a combined standard uncertainty of 0.17 X 10(-5) and with a small wavelength dependence over the 633-1539-nm range. (C) 2000 Optical Society of America OCIS codes: 120.5410, 120.6780, 160.4760.
引用
收藏
页码:5796 / 5800
页数:5
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