Layered materials like graphene, transition metal dichalcogenides(TMDs) etc. are of great importance in nanoelectronics and optoelectronics. Various exfoliation techniques used for the isolation into thin layers of these materials can impart different type of atomic defects in the system. The presence of defects can highly modify the properties displayed by them. Significant features related to the defect states can also show up in the optical spectroscopy results. Here, we discuss about the defect related modifications of photoluminescence peaks obtained from our as- synthesized MoS2 sample comprised of nanostructures and nanosheets and the associated electrical behavior.
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Naval Res Lab, Mat Sci & Technol Div, Washington, DC 20375 USA
Naval Res Lab, Natl Res Council, Washington, DC 20375 USANaval Res Lab, Mat Sci & Technol Div, Washington, DC 20375 USA
Siyaram, Saujan, V
Hanbicki, Aubrey T.
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Naval Res Lab, Mat Sci & Technol Div, Washington, DC 20375 USANaval Res Lab, Mat Sci & Technol Div, Washington, DC 20375 USA
Hanbicki, Aubrey T.
Rosenberger, Matthew R.
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Naval Res Lab, Mat Sci & Technol Div, Washington, DC 20375 USA
Naval Res Lab, Natl Res Council, Washington, DC 20375 USANaval Res Lab, Mat Sci & Technol Div, Washington, DC 20375 USA
Rosenberger, Matthew R.
Jernigan, Glenn G.
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Naval Res Lab, Elect Sci & Technol Div, Washington, DC 20375 USANaval Res Lab, Mat Sci & Technol Div, Washington, DC 20375 USA
Jernigan, Glenn G.
Chuang, Hsun-Jen
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Naval Res Lab, Mat Sci & Technol Div, Washington, DC 20375 USA
Naval Res Lab, Amer Soc Engn Educ, Washington, DC 20375 USANaval Res Lab, Mat Sci & Technol Div, Washington, DC 20375 USA
Chuang, Hsun-Jen
McCreary, Kathleen M.
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Naval Res Lab, Mat Sci & Technol Div, Washington, DC 20375 USANaval Res Lab, Mat Sci & Technol Div, Washington, DC 20375 USA
McCreary, Kathleen M.
Jonker, Berend T.
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Naval Res Lab, Mat Sci & Technol Div, Washington, DC 20375 USANaval Res Lab, Mat Sci & Technol Div, Washington, DC 20375 USA
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Korea Adv Inst Sci & Technol, Dept Mech Engn, Natl Creat Res Initiat Functionally Antagonist Na, 291 Daehak Ro, Daejeon 34141, South KoreaKorea Adv Inst Sci & Technol, Dept Mech Engn, Natl Creat Res Initiat Functionally Antagonist Na, 291 Daehak Ro, Daejeon 34141, South Korea
Thangasamy, Pitchai
Oh, Saewoong
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Korea Adv Inst Sci & Technol, Dept Mech Engn, Natl Creat Res Initiat Functionally Antagonist Na, 291 Daehak Ro, Daejeon 34141, South KoreaKorea Adv Inst Sci & Technol, Dept Mech Engn, Natl Creat Res Initiat Functionally Antagonist Na, 291 Daehak Ro, Daejeon 34141, South Korea
Oh, Saewoong
Nam, Sanghee
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Korea Adv Inst Sci & Technol, Dept Mech Engn, Natl Creat Res Initiat Functionally Antagonist Na, 291 Daehak Ro, Daejeon 34141, South KoreaKorea Adv Inst Sci & Technol, Dept Mech Engn, Natl Creat Res Initiat Functionally Antagonist Na, 291 Daehak Ro, Daejeon 34141, South Korea
Nam, Sanghee
Oh, Il-Kwon
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Korea Adv Inst Sci & Technol, Dept Mech Engn, Natl Creat Res Initiat Functionally Antagonist Na, 291 Daehak Ro, Daejeon 34141, South KoreaKorea Adv Inst Sci & Technol, Dept Mech Engn, Natl Creat Res Initiat Functionally Antagonist Na, 291 Daehak Ro, Daejeon 34141, South Korea