The formation of In-rich regions at the perphery of the inverted hexahonal pits of InGaN thin-films grown by metalorganic vapor phase epitaxy

被引:0
|
作者
Li, P [1 ]
Chua, SJ
Hao, M
Wang, W
Zhang, X
Sugahara, T
Sakai, S
机构
[1] Natl Univ Singapore, Ctr Optoelect, Dept Elect Engn, Singapore 119260, Singapore
[2] Inst Mat Res & Engn, Singapore, Singapore
[3] Univ Tokushima, Dept Elect & Elect Engn, Josanjima 7708506, Japan
关键词
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
InGaN thin films were grown by low-pressure metalorganic-vapor-phase-epitaxy (MOVPE) and characterized by cathodoluminescence (CL) and scanning electron microscopy(SEM). SEM images showed that InGaN samples have inverted hexagonal pits which are formed by the In segregation on the (10(1) over bar1) surfaces. Room temperature CL at the wavelengths corresponding to the GaN band edge, the In-poor and In-rich regions showed that the In-rich regions formed at the periphery of the hexagonal pits.
引用
收藏
页数:6
相关论文
共 50 条
  • [41] Homoepitaxial growth and characterization of ZnO(0001) thin films grown by metalorganic chemical vapor epitaxy
    Ive, Tommy
    Ben-Yaacov, Tammy
    Van de Walle, Chris G.
    Mishra, Umesh K.
    DenBaars, Steven P.
    Speck, James S.
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 6, NO 6, 2009, 6 (06): : 1460 - +
  • [42] Dependence of the V/III Ratio on Indium Incorporation in InGaN Films Grown by Metalorganic Vapour Phase Epitaxy
    Kumar, V. Suresh
    Ji, S. Y.
    Zhang, Y. T.
    Shojiki, K.
    Choi, J. H.
    Kimura, T.
    Hanada, T.
    Katayama, R.
    Matsuoka, T.
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2020, 20 (05) : 2979 - 2986
  • [43] Dual wavelength InGaN/GaN multi-quantum well LEDs grown by metalorganic vapor phase epitaxy
    Qi, YD
    Liang, H
    Tang, W
    Lu, ZD
    Lau, KM
    JOURNAL OF CRYSTAL GROWTH, 2004, 272 (1-4) : 333 - 340
  • [44] InGaN quantum dots grown by metalorganic vapor phase epitaxy employing a post-growth nitrogen anneal
    Oliver, RA
    Briggs, GAD
    Kappers, MJ
    Humphreys, CJ
    Yasin, S
    Rice, JH
    Smith, JD
    Taylor, RA
    APPLIED PHYSICS LETTERS, 2003, 83 (04) : 755 - 757
  • [45] Metalorganic vapor phase epitaxy grown InGaN/GaN light-emitting diodes on Si(001) substrate
    Schulze, F
    Dadgar, A
    Bläsing, J
    Diez, A
    Krost, A
    APPLIED PHYSICS LETTERS, 2006, 88 (12)
  • [46] Optical and electrical characterizations of In-doped GaN films grown by metalorganic vapor phase epitaxy
    Chung, Hao-Ming
    Huang, Huai-Ying
    Pan, Yung-Chung
    Chuang, Wang-Cheng
    Shu, Chen-Ke
    Chen, Wen-Hsing
    Lee, Ming-Chih
    Chen, Wei-Kuo
    Journal of the Chinese Institute of Electrical Engineering, Transactions of the Chinese Institute of Engineers, Series E/Chung KuoTien Chi Kung Chieng Hsueh K'an, 2000, 7 (03): : 195 - 201
  • [47] Raman and x-ray studies of InN films grown by metalorganic vapor phase epitaxy
    Lee, MC
    Lin, HC
    Pan, YC
    Shu, CK
    Ou, J
    Chen, WH
    Chen, WK
    APPLIED PHYSICS LETTERS, 1998, 73 (18) : 2606 - 2608
  • [48] Effects in carrier dynamics of Isolectronic In doped in GaN films grown by metalorganic vapor phase epitaxy
    Huang, HY
    Shu, CK
    Lin, WC
    Liao, KC
    Chuang, CH
    Lee, MC
    Chen, WH
    Chen, WK
    Lee, YY
    PROCEEDINGS OF THE INTERNATIONAL WORKSHOP ON NITRIDE SEMICONDUCTORS, 2000, 1 : 610 - 613
  • [49] Optical properties of InN films grown by pressurized-reactor metalorganic vapor phase epitaxy
    Zhang, Yuantao
    Kimura, Takeshi
    Prasertusk, Kiattiwut
    Iwabuchi, Takuya
    Kumar, Suresh
    Liu, Yuhuai
    Katayama, Ryuji
    Matsuoka, Takashi
    THIN SOLID FILMS, 2013, 536 : 152 - 155