Direct measurement of thrust induced by a magnetron sputtering source

被引:6
|
作者
Takahashi, Kazunori [1 ]
Miura, Hidemasa [1 ]
机构
[1] Tohoku Univ, Dept Elect Engn, Sendai, Miyagi 9808579, Japan
基金
日本科学技术振兴机构; 日本学术振兴会;
关键词
D O I
10.1063/5.0042798
中图分类号
O59 [应用物理学];
学科分类号
摘要
The direct measurement of thrust imparted by a magnetron sputtering source operated in argon is performed using a pendulum thrust balance immersed in vacuum, where various target materials are tested. The imparted thrust is clearly changed by the target material, while the ion density, which is expected to be mostly the argon ions, is unchanged. The maximum thrust-to-power ratio of 10-12mN/kW is obtained for a copper target, which has a maximum sputtering yield in the target materials tested here. It is shown that the plasma pressure force is much smaller than the detected thrust, demonstrating the thrust generation via the material ejection by the sputtering process.
引用
收藏
页数:5
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