Mechanism of GeH4 dissociation on Si(111)-(7x7)

被引：2
|
作者：
Braun, J [1 ]
Rauscher, H [1 ]
Behm, RJ [1 ]
机构：
[1] Univ Ulm, Abt Oberflachenchem & Katalyse, D-89069 Ulm, Germany
来源：
SURFACE SCIENCE | 2003年 / 531卷 / 03期
关键词：
silicon; hydrides; chemisorption; sticking; scanning tunneling microscopy; X-ray pbotoelectron spectroscopy;
D O I：
10.1016/S0039-6028(03)00513-2
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Results of an STM study of dissociative GeH4 adsorption on Si(1 1 1)-(7 x 7) at 300 K show that GeH4 adsorbs under scission of two Ge-H bonds according to GeH4(g) + 4db --> GeH2(ad) + 2H(ad). GeH2 binds to two adatom dangling bonds in a bridged configuration, while the two released hydrogen atoms saturate two additional dangling bonds. The GeH4 sticking coefficient under these conditions is 1.2 x 10(-6), one order of magnitude smaller than for SiH4. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：265 / 271
页数：7
相关论文
共 50 条
  • [31] Boundaries of 7x7 reconstruction domains on Si(111)
    Zhou, Yinghui
    Zhou, Changjie
    Zhan, Huahan
    Wu, Qihui
    Kang, Junyong
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2006, 9 (1-3) : 279 - 282
  • [32] SI(111) 7X7 SURFACE-STRUCTURE
    LEVINE, JD
    MARK, P
    MCFARLANE, SH
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (04): : 878 - 882
  • [33] Cell model of Si(111)7x7 structure
    Kato, T
    Saigo, Y
    Uchibe, M
    Tochihara, H
    Shimada, W
    SURFACE SCIENCE, 1998, 416 (1-2) : 112 - 120
  • [34] Templating an organic array with Si(111)-7x7
    Weymouth, Alfred J.
    Miwa, Roberto H.
    Edge, Graham J. A.
    Srivastava, Gyaneshwar P.
    McLean, Alastair B.
    CHEMICAL COMMUNICATIONS, 2011, 47 (28) : 8031 - 8033
  • [35] THE CHEMISORPTION OF CHLOROSILANES AND CHLORINE ON SI(111)7X7
    WHITMAN, LJ
    JOYCE, SA
    YARMOFF, JA
    MCFEELY, FR
    TERMINELLO, LJ
    SURFACE SCIENCE, 1990, 232 (03) : 297 - 306
  • [36] Studies of chemisorbed tetracene on Si(111)-7x7
    Yong, Kian Soon
    Zhang, Yong Ping
    Yang, Shuo-Wang
    Wu, Ping
    Xu, Guo Qin
    JOURNAL OF PHYSICAL CHEMISTRY A, 2007, 111 (49): : 12266 - 12274
  • [37] Surface topography of the Si(111)-7x7 reconstruction
    Ke, SH
    Uda, T
    Terakura, K
    PHYSICAL REVIEW B, 2000, 62 (23): : 15319 - 15322
  • [38] Initial stages of In adsorption on Si(111) 7x7
    Lin, XF
    Mai, HA
    Chizhov, I
    Willis, RF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (02): : 995 - 999
  • [39] Dissociative adsorption of pyrrole on Si(111)-(7x7)
    Yuan, ZL
    Chen, XF
    Wang, ZH
    Yong, KS
    Cao, Y
    Xu, GQ
    JOURNAL OF CHEMICAL PHYSICS, 2003, 119 (19): : 10389 - 10395
  • [40] STABILIZING OF THE SI(111)7X7 SURFACE BY OXYGEN
    VERWOERD, WS
    OSUCH, K
    SURFACE SCIENCE, 1991, 256 (1-2) : L593 - L597
12345