Bell Labs researchers demonstrate projection electron beam lithography

被引：0
|
作者：
不详
机构：
来源：
MICROWAVE JOURNAL | 1998年 / 41卷 / 01期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
下载
收藏
页码：39 / 39
页数：1
相关论文
共 50 条
  • [21] Wafer heating analysis for electron-beam projection lithography
    Chang, J
    Nellis, GF
    Engelstad, RL
    Lovell, EG
    Sogard, MR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (06): : 2657 - 2662
  • [22] Stencil mask technology for electron-beam projection lithography
    Amemiya, I
    Yamashita, H
    Nakatsuka, S
    Sakurai, T
    Kimura, I
    Tsukahara, M
    Nagarekawa, O
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (6B): : 3811 - 3815
  • [23] Development of data conversion system for electron beam projection lithography
    Kato, K
    Nishizawa, K
    Haruki, T
    Inoue, T
    Kamijo, K
    Kojima, S
    Minami, H
    Okamoto, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06): : 2672 - 2677
  • [24] Progress in resists development for EPL (electron beam projection lithography)
    Kai, T
    Nishiyama, S
    Saitou, A
    Shimokawa, T
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2003, 16 (03) : 447 - 450
  • [25] Stencil mask technology for electron-beam projection lithography
    Amemiya, I., 1600, Japan Society of Applied Physics (42):
  • [26] ELECTRON PROJECTION LITHOGRAPHY
    FULLER, CE
    GOULD, PA
    VINTON, DJ
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (03) : C158 - C158
  • [27] electron-beam focusing in 1:1 electron projection lithography system
    Sidorkin, V
    Moon, CW
    El Mostafa, B
    Lee, SW
    Yoo, IK
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (01): : 224 - 230
  • [28] AT&T rings out redundancies for Bell Labs' researchers
    Macilwain, C
    NATURE, 1996, 379 (6561) : 102 - 102
  • [29] Mask characteristics for projection electron-beam lithography with demagnification imaging
    Peng, KW
    Zhang, F
    Wu, GJ
    Gu, WQ
    Sun, X
    Kang, NK
    Pu, QR
    Ding, ZJ
    MICROELECTRONIC ENGINEERING, 2002, 61-2 : 277 - 283
  • [30] Development of a simulator for cell-projection type electron beam lithography
    Kotera, Masatoshi
    Yamaguchi, Kiyoshi
    Matsuoka, Koji
    Okagawa, Takashi
    Kojima, Yoshinori
    Yamabe, Masaki
    Shinku/Journal of the Vacuum Society of Japan, 1999, 42 (08): : 764 - 767
12345