Bell Labs researchers demonstrate projection electron beam lithography

被引:0
|
作者
不详
机构
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
下载
收藏
页码:39 / 39
页数:1
相关论文
共 50 条
  • [1] Projection electron beam lithography for nanotechnology
    Potapkin O.D.
    Troshin B.V.
    Bulletin of the Russian Academy of Sciences: Physics, 2010, 74 (07) : 1015 - 1019
  • [2] Cell projection electron beam lithography
    Matsuoka, G.
    Saitou, N.
    Microlithography World, 7 (02):
  • [3] Proximity effect correction in projection electron beam lithography (scattering with angular limitation projection electron-beam lithography)
    Liddle, J.Alexander
    Watson, G.Patrick
    Berger, Steven D.
    Miller, Peter D.
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1995, 34 (12 B): : 6672 - 6678
  • [4] Proximity effect correction in projection electron beam lithography (scattering with angular limitation projection electron-beam lithography)
    Liddle, JA
    Watson, GP
    Berger, SD
    Miller, PD
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (12B): : 6672 - 6678
  • [5] RING CATHODE ELECTRON BEAM PROJECTION LITHOGRAPHY
    Ang, W. K.
    Khursheed, A.
    RECENT TRENDS IN CHARGED PARTICLE OPTICS AND SURFACE PHYSICS INSTRUMENTATION, 2018, : 10 - 10
  • [6] Bell labs researchers develop browsable TV
    Hays, N
    Bresenham, J
    IEEE COMPUTER GRAPHICS AND APPLICATIONS, 1996, 16 (02) : 90 - 90
  • [7] Scattering with angular limitation projection electron beam lithography for suboptical lithography
    Harriott, LR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (06): : 2130 - 2135
  • [8] Scattering with angular limitation projection electron beam lithography for suboptical lithography
    Harriott, Lloyd R.
    Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1997, 15 (06):
  • [9] Low energy electron beam proximity projection lithography
    Samoto, N
    Yoshida, A
    Takano, H
    Endo, A
    Fukui, T
    JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS, 2005, 4 (02): : 1 - 6
  • [10] Monte Carlo simulation of projection electron beam lithography
    Sun, X.
    Xiao, P.
    Ding, Z. J.
    NANOSCIENCE AND TECHNOLOGY, PTS 1 AND 2, 2007, 121-123 : 1097 - 1101