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- [31] Benefiting from polarization - effects on high-NA imagingOPTICAL MICROLITHOGRAPHY XVII, PTS 1-3, 2004, 5377 : 68 - 79Smith, BW论文数: 0 引用数: 0 h-index: 0机构: Rochester Inst Technol, Dept Microwave Engn, Rochester, NY 14623 USA Rochester Inst Technol, Dept Microwave Engn, Rochester, NY 14623 USAZavyalova, L论文数: 0 引用数: 0 h-index: 0机构: Rochester Inst Technol, Dept Microwave Engn, Rochester, NY 14623 USA Rochester Inst Technol, Dept Microwave Engn, Rochester, NY 14623 USAEstroff, A论文数: 0 引用数: 0 h-index: 0机构: Rochester Inst Technol, Dept Microwave Engn, Rochester, NY 14623 USA Rochester Inst Technol, Dept Microwave Engn, Rochester, NY 14623 USA
- [32] Scaling and readiness of underlayers for high-NA EUV lithographyINTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2022, 2022, 12292Fallica, Roberto论文数: 0 引用数: 0 h-index: 0机构: IMEC, Leuven, Belgium IMEC, Leuven, BelgiumDe Simone, Danilo论文数: 0 引用数: 0 h-index: 0机构: IMEC, Leuven, Belgium IMEC, Leuven, BelgiumChen, Steven论文数: 0 引用数: 0 h-index: 0机构: IMEC, Leuven, Belgium Karlsruhe Inst Technol KIT, Karlsruhe, Germany IMEC, Leuven, BelgiumSafdar, Muhammad论文数: 0 引用数: 0 h-index: 0机构: IMEC, Leuven, Belgium Munich Univ Appl Sci MUAS, Munich, Germany IMEC, Leuven, BelgiumSuh, Hyo Seon论文数: 0 引用数: 0 h-index: 0机构: IMEC, Leuven, Belgium IMEC, Leuven, Belgium
- [33] Model based high NA anamorphic EUV RETEXTREME ULTRAVIOLET (EUV) LITHOGRAPHY IX, 2018, 10583Jiang, Fan论文数: 0 引用数: 0 h-index: 0机构: Mentor, Wilsonville, OR 97070 USA Mentor, Wilsonville, OR 97070 USAWiaux, Vincent论文数: 0 引用数: 0 h-index: 0机构: IMEC, Leuven, Belgium Mentor, Wilsonville, OR 97070 USAFenger, Germain论文数: 0 引用数: 0 h-index: 0机构: Mentor, Wilsonville, OR 97070 USA Mentor, Wilsonville, OR 97070 USAClifford, Chris论文数: 0 引用数: 0 h-index: 0机构: Mentor, Wilsonville, OR 97070 USA Mentor, Wilsonville, OR 97070 USALiubich, Vlad论文数: 0 引用数: 0 h-index: 0机构: Mentor, Wilsonville, OR 97070 USA Mentor, Wilsonville, OR 97070 USAHendrickx, Eric论文数: 0 引用数: 0 h-index: 0机构: IMEC, Leuven, Belgium Mentor, Wilsonville, OR 97070 USA
- [34] Advanced development methods for high-NA EUV lithographyADVANCES IN PATTERNING MATERIALS AND PROCESSES XL, 2023, 12498Dinh, Cong Que论文数: 0 引用数: 0 h-index: 0机构: Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, Japan Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanNagahara, Seiji论文数: 0 引用数: 0 h-index: 0机构: Tokyo Electron Ltd, 3-1 Akasaka 5 Chome,Minato Ku, Tokyo 1076325, Japan Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanKuwahara, Yuhei论文数: 0 引用数: 0 h-index: 0机构: Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, Japan Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanDauendorffer, Arnaud论文数: 0 引用数: 0 h-index: 0机构: Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, Japan Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanOkada, Soichiro论文数: 0 引用数: 0 h-index: 0机构: Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, Japan Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanFujimoto, Seiji论文数: 0 引用数: 0 h-index: 0机构: Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, Japan Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanKawakami, Shinichiro论文数: 0 引用数: 0 h-index: 0机构: Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, Japan Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanShimura, Satoru论文数: 0 引用数: 0 h-index: 0机构: Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, Japan Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanMuramatsu, Makoto论文数: 0 引用数: 0 h-index: 0机构: Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, Japan Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanCho, Kayoko论文数: 0 引用数: 0 h-index: 0机构: Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, Japan Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanLiu, Xiang论文数: 0 引用数: 0 h-index: 0机构: Tokyo Electron Ltd, 3-1 Akasaka 5 Chome,Minato Ku, Tokyo 1076325, Japan Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanNafus, Kathleen论文数: 0 引用数: 0 h-index: 0机构: Tokyo Electron Amer Inc, 2400 Grove Blvd Austin, Austin, TX 78741 USA Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanCarcasi, Michael论文数: 0 引用数: 0 h-index: 0机构: Tokyo Electron Amer Inc, 2400 Grove Blvd Austin, Austin, TX 78741 USA Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanAgarwal, Ankur论文数: 0 引用数: 0 h-index: 0机构: Tokyo Electron Amer Inc, 2400 Grove Blvd Austin, Austin, TX 78741 USA Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanSomervell, Mark论文数: 0 引用数: 0 h-index: 0机构: Tokyo Electron Amer Inc, 2400 Grove Blvd Austin, Austin, TX 78741 USA Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanHuli, Lior论文数: 0 引用数: 0 h-index: 0机构: TEL Technol Ctr Amer LLC, 255 Fuller Rd,Suite 214, Albany, NY 12203 USA Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanKato, Kanzo论文数: 0 引用数: 0 h-index: 0机构: TEL Technol Ctr Amer LLC, 255 Fuller Rd,Suite 214, Albany, NY 12203 USA Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanKocsis, Michael论文数: 0 引用数: 0 h-index: 0机构: Inpria Corp, 1100 NE Circle Blvd Suite 360, Corvallis, OR 97330 USA Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanDe Schepper, Peter论文数: 0 引用数: 0 h-index: 0机构: Inpria Corp, 1100 NE Circle Blvd Suite 360, Corvallis, OR 97330 USA Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanMeyers, Stephen论文数: 0 引用数: 0 h-index: 0机构: Inpria Corp, 1100 NE Circle Blvd Suite 360, Corvallis, OR 97330 USA Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanMcQuade, Lauren论文数: 0 引用数: 0 h-index: 0机构: Inpria Corp, 1100 NE Circle Blvd Suite 360, Corvallis, OR 97330 USA Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanKasahara, Kazuki论文数: 0 引用数: 0 h-index: 0机构: JSR Micro Inc, 1280 N Mathilda Ave, Sunnyvale, CA 94089 USA Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanSantaclara, Jara Garcia论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, Netherlands Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanHoefnagels, Rik论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, Netherlands Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanAnderson, Chris论文数: 0 引用数: 0 h-index: 0机构: Lawrence Berkeley Natl Lab, 1 Cyclotron Rd, Berkeley, CA 94720 USA Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, JapanNaulleau, Patrick论文数: 0 引用数: 0 h-index: 0机构: Lawrence Berkeley Natl Lab, 1 Cyclotron Rd, Berkeley, CA 94720 USA Tokyo Electron Kyushu Ltd, 1-1 Fukuhara, Kumamoto 8611116, Japan
- [35] Inverse design of high-NA metalens for maskless lithographyNANOPHOTONICS, 2023, 12 (13) : 2371 - 2381论文数: 引用数: h-index:机构:Zhang, Feng论文数: 0 引用数: 0 h-index: 0机构: LumArray Inc, 15 Ward St, Somerville, MA 02143 USA Hanyang Univ, Dept Elect Engn, Seoul 04763, South KoreaLi, Hao论文数: 0 引用数: 0 h-index: 0机构: Yale Univ, Dept Appl Phys, New Haven, CT 06511 USA Yale Univ, Energy Sci Inst, New Haven, CT 06511 USA Hanyang Univ, Dept Elect Engn, Seoul 04763, South KoreaMiller, Owen D. D.论文数: 0 引用数: 0 h-index: 0机构: Yale Univ, Dept Appl Phys, New Haven, CT 06511 USA Yale Univ, Energy Sci Inst, New Haven, CT 06511 USA Hanyang Univ, Dept Elect Engn, Seoul 04763, South KoreaSmith, Henry I. I.论文数: 0 引用数: 0 h-index: 0机构: LumArray Inc, 15 Ward St, Somerville, MA 02143 USA MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA Hanyang Univ, Dept Elect Engn, Seoul 04763, South Korea
- [36] Polarizing assist features for high-NA optical lithography22ND ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 2002, 4889 : 1313 - 1323Chen, FT论文数: 0 引用数: 0 h-index: 0机构: Intel Corp, Santa Clara, CA 95014 USA Intel Corp, Santa Clara, CA 95014 USA
- [37] High-NA broadband achromatic metalens in the visible rangeOPTICAL MATERIALS EXPRESS, 2023, 13 (09) : 2690 - 2698Sun, XiaoHong论文数: 0 引用数: 0 h-index: 0机构: Zhengzhou Univ, Sch Elect & Informat Engn, Henan Key Lab Laser & Optoelect Informat Technol, Zhengzhou 450001, Peoples R China Zhengzhou Univ, Sch Elect & Informat Engn, Henan Key Lab Laser & Optoelect Informat Technol, Zhengzhou 450001, Peoples R ChinaYan, MengMeng论文数: 0 引用数: 0 h-index: 0机构: Zhengzhou Univ, Sch Elect & Informat Engn, Henan Key Lab Laser & Optoelect Informat Technol, Zhengzhou 450001, Peoples R China Zhengzhou Univ, Sch Elect & Informat Engn, Henan Key Lab Laser & Optoelect Informat Technol, Zhengzhou 450001, Peoples R ChinaHuo, Shuang论文数: 0 引用数: 0 h-index: 0机构: Zhengzhou Univ, Sch Elect & Informat Engn, Henan Key Lab Laser & Optoelect Informat Technol, Zhengzhou 450001, Peoples R China Zhengzhou Univ, Sch Elect & Informat Engn, Henan Key Lab Laser & Optoelect Informat Technol, Zhengzhou 450001, Peoples R ChinaFan, JiaJin论文数: 0 引用数: 0 h-index: 0机构: Zhengzhou Univ, Sch Elect & Informat Engn, Henan Key Lab Laser & Optoelect Informat Technol, Zhengzhou 450001, Peoples R China Zhengzhou Univ, Sch Elect & Informat Engn, Henan Key Lab Laser & Optoelect Informat Technol, Zhengzhou 450001, Peoples R ChinaZhao, SaiLi论文数: 0 引用数: 0 h-index: 0机构: Zhengzhou Univ, Sch Elect & Informat Engn, Henan Key Lab Laser & Optoelect Informat Technol, Zhengzhou 450001, Peoples R China Zhengzhou Univ, Sch Elect & Informat Engn, Henan Key Lab Laser & Optoelect Informat Technol, Zhengzhou 450001, Peoples R ChinaGuo, RuiJun论文数: 0 引用数: 0 h-index: 0机构: Zhengzhou Univ, Sch Elect & Informat Engn, Henan Key Lab Laser & Optoelect Informat Technol, Zhengzhou 450001, Peoples R China Zhengzhou Univ, Sch Elect & Informat Engn, Henan Key Lab Laser & Optoelect Informat Technol, Zhengzhou 450001, Peoples R ChinaZeng, Yong论文数: 0 引用数: 0 h-index: 0机构: Zhengzhou Univ, Sch Elect & Informat Engn, Henan Key Lab Laser & Optoelect Informat Technol, Zhengzhou 450001, Peoples R China Zhengzhou Univ, Sch Elect & Informat Engn, Henan Key Lab Laser & Optoelect Informat Technol, Zhengzhou 450001, Peoples R China
- [39] High-NA EUV projection lens with central obscurationEXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VII, 2016, 9776Zhevlakov, A. P.论文数: 0 引用数: 0 h-index: 0机构: Natl Res Univ Informat Technol Mech & Opt, St Petersburg, Russia SI Vavilov State Opt Inst, St Petersburg, Russia Natl Res Univ Informat Technol Mech & Opt, St Petersburg, RussiaSeisyan, R. P.论文数: 0 引用数: 0 h-index: 0机构: Ioffe Phys Tech Inst RAS, St Petersburg, Russia Natl Res Univ Informat Technol Mech & Opt, St Petersburg, RussiaBespalov, V. G.论文数: 0 引用数: 0 h-index: 0机构: Natl Res Univ Informat Technol Mech & Opt, St Petersburg, Russia Natl Res Univ Informat Technol Mech & Opt, St Petersburg, RussiaElizarov, V. V.论文数: 0 引用数: 0 h-index: 0机构: Natl Res Univ Informat Technol Mech & Opt, St Petersburg, Russia Natl Res Univ Informat Technol Mech & Opt, St Petersburg, RussiaGrishkanich, A. S.论文数: 0 引用数: 0 h-index: 0机构: Natl Res Univ Informat Technol Mech & Opt, St Petersburg, Russia Natl Res Univ Informat Technol Mech & Opt, St Petersburg, RussiaKascheev, S. V.论文数: 0 引用数: 0 h-index: 0机构: Natl Res Univ Informat Technol Mech & Opt, St Petersburg, Russia Natl Res Univ Informat Technol Mech & Opt, St Petersburg, RussiaBagdasarov, A. A.论文数: 0 引用数: 0 h-index: 0机构: Natl Res Univ Informat Technol Mech & Opt, St Petersburg, Russia SI Vavilov State Opt Inst, St Petersburg, Russia Natl Res Univ Informat Technol Mech & Opt, St Petersburg, RussiaSidorov, I. S.论文数: 0 引用数: 0 h-index: 0机构: Univ Eastern Finland, Kuopio, Finland Natl Res Univ Informat Technol Mech & Opt, St Petersburg, Russia
- [40] High-NA EUV lithography optics becomes realityEXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XI, 2020, 11323Ischmeier, Lars论文数: 0 引用数: 0 h-index: 0机构: Carl Zeiss SMT GmbH, Rudolf Eber Str 2, D-73447 Oberkochen, Germany ZEISS Grp, Rudolf Eber Str 2, D-73447 Oberkochen, Germany Carl Zeiss SMT GmbH, Rudolf Eber Str 2, D-73447 Oberkochen, GermanyGraupner, Paul论文数: 0 引用数: 0 h-index: 0机构: Carl Zeiss SMT GmbH, Rudolf Eber Str 2, D-73447 Oberkochen, Germany ZEISS Grp, Rudolf Eber Str 2, D-73447 Oberkochen, Germany Carl Zeiss SMT GmbH, Rudolf Eber Str 2, D-73447 Oberkochen, GermanyKurz, Peter论文数: 0 引用数: 0 h-index: 0机构: Carl Zeiss SMT GmbH, Rudolf Eber Str 2, D-73447 Oberkochen, Germany ZEISS Grp, Rudolf Eber Str 2, D-73447 Oberkochen, Germany Carl Zeiss SMT GmbH, Rudolf Eber Str 2, D-73447 Oberkochen, GermanyKaiser, Winfried论文数: 0 引用数: 0 h-index: 0机构: Carl Zeiss SMT GmbH, Rudolf Eber Str 2, D-73447 Oberkochen, Germany ZEISS Grp, Rudolf Eber Str 2, D-73447 Oberkochen, Germany Carl Zeiss SMT GmbH, Rudolf Eber Str 2, D-73447 Oberkochen, GermanyVan Schoot, Jan论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, Netherlands Carl Zeiss SMT GmbH, Rudolf Eber Str 2, D-73447 Oberkochen, GermanyMallmann, Jorg论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, Netherlands Carl Zeiss SMT GmbH, Rudolf Eber Str 2, D-73447 Oberkochen, Germanyde Pee, Joost论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, Netherlands Carl Zeiss SMT GmbH, Rudolf Eber Str 2, D-73447 Oberkochen, GermanyStoeldra, Judon论文数: 0 引用数: 0 h-index: 0机构: ASML Netherlands BV, De Run 6501, NL-5504 DR Veldhoven, Netherlands Carl Zeiss SMT GmbH, Rudolf Eber Str 2, D-73447 Oberkochen, Germany